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Optical properties of nickel(II)-azo complexes thin films for potential application as high-density recordable optical recording media

机译：镍（II）-偶氮配合物薄膜的光学性质可能用作高密度可记录光学记录介质

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Smooth thin films of three kinds of nickel(II)-azo complexes were prepared by the spin-coating method. Absorption spectra of the thin films on K9 glass substrate in the 300-600 nn wavelength region were measured. Optical constants (complex refractive index N = n + ik) and thickness of the thin films prepared on single-crystal silicon substrate in the 300-600 nm wavelength region were investigated on rotating analyzer-polarizer type of scanning ellipsometer, and dielectric constants epsilon (epsilon = epsilon(1) + i epsilon(2)), absorption coefficients a as well as reflectance R of thin films were then calculated at 405 nm. In addition, in order to examine the possible use of nickel(II)-azo complex thin film as an optical recording medium, one of the nickel(II)-azo complex thin film prepared on K9 glass substrate with an Ag reflective layer was also studied by atomic force microscopy and static optical recording. The results show that the nickel(II)-azo complex thin film is smooth and has a root mean square surface roughness of 2.25 nm, and the recording marks on the nickel(II)-azo complex thin film are very clear and circular, and their size can reach 200 nn or less. (c) 2006 Elsevier Ltd. All rights reserved.
机译：通过旋涂法制备了三种镍（II）-偶氮配合物的光滑薄膜。测量了K9玻璃基板上的薄膜在300-600 nn波长范围内的吸收光谱。在旋转分析仪-偏振器型扫描椭偏仪上研究了在300-600 nm波长范围内在单晶硅衬底上制备的薄膜的光学常数（复数折射率N = n + ik）和介电常数ε（ epsilon = epsilon（1）+ i epsilon（2）），然后在405 nm处计算薄膜的吸收系数a和反射率R。另外，为了研究将镍（II）-偶氮配合物薄膜用作光记录介质的可能性，还制备了在具有Ag反射层的K9玻璃基板上制备的镍（II）-偶氮配合物薄膜之一。由原子力显微镜和静态光学记录研究。结果表明，镍（II）-偶氮配合物薄膜光滑，均方根表面粗糙度为2.25 nm，镍（II）-偶氮配合物薄膜上的记录标记非常清晰且呈圆形，并且它们的大小可以达到200 nn或更小。 （c）2006 Elsevier Ltd.保留所有权利。

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