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Dielectric behavior of spin-deposited nanocrystalline nickel-zinc ferrite thin films processed by citrate-route

机译:柠檬酸法自旋沉积纳米晶镍锌铁氧体薄膜的介电行为

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Nanocrystalline nickel-zinc ferrite thin films with the general formula Ni1-xZnxFe2O4, where x = 0.0, 0.2. 0.4 and 0.6 were fabricated via a chemical route known as the citrate precursor route. These films were spin-deposited on indium-fin oxide coated glass, fused quartz and amorphous Si-wafer substrates, and annealed at various temperatures up to 650 degrees C. The films annealed below 400 degrees C were found to be X-ray amorphous, while the films annealed at and above 400 'C were polycrystalline exhibiting a single-phase spinel structure. The average grain size of the films evaluated by transmission electron microscopy, is found to be in the range 4-8.5 nm. The room temperature DC resistivity of the films is in the range 10(3)-10(7) Omega m. Dielectric constant and dielectric loss were measured in the frequency range 100 Hz-1 MHz. Dielectric constant of the films is found to lie between 25 and 44, while the loss factor is if the order of 10(-2). The higher values of the dielectric constant for films having higher zinc concentration are attributable to the enhanced hopping between Fe2+ and Fe3+ ions in these samples. The M-H hysteresis measurement of the nickel ferrite thin films annealed at 650 degrees C showed narrow hysteresis loop-a characteristic of soft ferromagnetic material. (c) 2005 Elsevier Ltd. All rights reserved.
机译:通式为Ni1-xZnxFe2O4的纳米晶镍锌铁氧体薄膜,其中x = 0.0,0.2。 0.4和0.6是通过称为柠檬酸盐前体途径的化学途径制备的。将这些薄膜旋涂在镀有氧化铟锡的玻璃,熔融石英和非晶硅晶片基板上,并在高达650摄氏度的各种温度下进行退火。发现在400摄氏度以下退火的薄膜为X射线非晶态,而在400'C或更高温度退火的薄膜是多晶的,具有单相尖晶石结构。通过透射电子显微镜评估的膜的平均晶粒尺寸被发现在4-8.5nm的范围内。薄膜的室温直流电阻率在10(3)-10(7)Ω范围内。在100Hz-1MHz的频率范围内测量介电常数和介电损耗。发现膜的介电常数在25至44之间,而损耗因子为10(-2)的量级。具有较高锌浓度的膜的较高介电常数值归因于这些样品中Fe2 +和Fe3 +离子之间的跳变增强。在650℃退火的镍铁氧体薄膜的M-H磁滞测量显示出狭窄的磁滞回线,这是软铁磁材料的特征。 (c)2005 Elsevier Ltd.保留所有权利。

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