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Crystallization of amorphous Co2MnSi thin film

机译:非晶态Co2MnSi薄膜的结晶

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Amorphous Co2MnSi thin film was deposited using radio-frequency sputtering. The amorphous film crystallized into a single-phased L2(1) structure at 500 degreesC, which was highly disordered. The structure was meta-stable as the crystallized film decomposed upon further heating. Increasing the annealing temperature to 600 degreesC precipitated fee Co together with Co2MnSi. Magnetic measurements showed that the as- deposited amorphous film was paramagnetic, exhibiting a spin glass state below 44 K. The phase transition at 500 degreesC produced a ferromagnetic Co2MnSi thin film whose saturation magnetic moment was considerably lower than reported values due to the disordered structure of the crystallized film. (C) 2004 Elsevier Ltd. All rights reserved.
机译:使用射频溅射沉积非晶态的Co2MnSi薄膜。该非晶膜在500℃下结晶成单相L2(1)结构,这是高度无序的。随着结晶膜在进一步加热下分解,该结构是亚稳定的。将退火温度提高到600℃,与Co2MnSi一起沉淀出Co。磁性测量表明,沉积的非晶态膜是顺磁性的,在44 K以下表现出自旋玻璃态。在500℃下的相变产生了铁磁Co2MnSi薄膜,由于其无序结构,其饱和磁矩大大低于报道的值。结晶膜。 (C)2004 Elsevier Ltd.保留所有权利。

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