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首页> 外文期刊>Solid-State Electronics >A new T-Shaped Source/Drain Extension (T-SSDE) Gate Underlap GAA MOSFET with enhanced subthreshold analog/RF performance for low power applications
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A new T-Shaped Source/Drain Extension (T-SSDE) Gate Underlap GAA MOSFET with enhanced subthreshold analog/RF performance for low power applications

机译:新型T形源极/漏极扩展(T-SSDE)栅极下重叠GAA MOSFET,具有增强的亚阈值模拟/ RF性能,适用于低功耗应用

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摘要

In the proposed work, a novel T-Shaped Source/Drain Extension (T-SSDE) Gate Underlap Gate All Around (GAA) MOSFET is presented and its performance is compared with that of corresponding Conventional Gate Underlap GAA MOSFET using ATLAS-3D device simulator. A quantitative study of main figure of merits (FOMs) for T-SSDE Underlap GAA has been carried out at different Gate Underlap lengths. It is shown that in T-SSDE, short channel effects (SCEs) are suppressed due to enhanced carrier transport efficiency. The results show an improvement in drain current, I_(on)/I_(off) ratio, transconductance, high unity-gain frequency f_T and superior analog/RF performance as compared to conventional Gate Underlap GAA MOSFET, thus, making it a better substitute of conventional Underlap Gate GAA devices for faster switching and low power applications.
机译:在拟议的工作中,提出了一种新颖的T型源极/漏极扩展(T-SSDE)栅极下重叠全能栅极(GAA)MOSFET,并使用ATLAS-3D器件仿真器将其性能与相应的常规栅极下重叠GAA MOSFET进行了比较。 。在不同的Gate Underlap长度下,对T-SSDE Underlap GAA的主要优值(FOM)进行了定量研究。结果表明,在T-SSDE中,由于提高了载波传输效率,因此可以抑制短信道效应(SCE)。结果表明,与传统的Gate Underlap GAA MOSFET相比,漏极电流,I_(on)/ I_(off)比,跨导,高单位增益频率f_T和出色的模拟/ RF性能得到了改善,因此,它是更好的替代品传统的Underlap Gate GAA器件,可实现更快的开关速度和低功耗应用。

著录项

  • 来源
    《Solid-State Electronics》 |2014年第11期|13-17|共5页
  • 作者单位

    Semiconductor Device Research Laboratory, Department of Electronic Science, University of Delhi, New Delhi 110021, India;

    Department of Physics, Motilal Nehru College, University of Delhi, New Delhi 110021, India;

    Semiconductor Device Research Laboratory, Department of Electronic Science, University of Delhi, New Delhi 110021, India;

    Department of Electronics and Communication Engineering, Maharaja Agrasen Institute of Technology, New Delhi 110086, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Gate All Around (GAA) MOSFET; Short channel effects (SCEs); Source/Drain Extension; Underlap Gate;

    机译:栅极全向(GAA)MOSFET;短通道效应(SCE);源极/漏极扩展;潜门;

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