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Performance improvement of oxide thin-film transistors with a two-step-annealing method

机译:两步退火法改善氧化物薄膜晶体管的性能

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摘要

In this paper, a thin-film transistor (TFT) with indium zinc oxide (IZO) channel layer was fabricated using a two-step-annealing method in which the IZO film experienced annealing steps before the etch-stopper-layer formation and after the whole device completion. The device showed better uniformity and better stability under positive bias stress, negative bias illumination stress, and temperature stress, compared to those with only one post annealing step. The calculated falling rate of the Fermi lever of the IZO channel for the two-step annealing device was as high as 0.593 eV/V, compared to 0.213 eV/V for the only-post-annealing-step one. And the corresponding density of subgap state was 4.4 × 10~(15) and 1.6 × 10~(16) eV~(-1) cm~(-3) for the device with two annealing steps and with only one post annealing step, respectively.
机译:在本文中,采用两步退火方法制造了具有氧化铟锌(IZO)沟道层的薄膜晶体管(TFT),其中IZO膜在蚀刻停止层形成之前和蚀刻停止层形成后经历了退火步骤。整个设备完成。与仅具有一个后退火步骤的器件相比,该器件在正偏置应力,负偏置照明应力和温度应力下显示出更好的均匀性和更好的稳定性。对于两步退火设备,IZO通道的费米杠杆的计算下降率高达0.593 eV / V,而仅在后退火步骤中为0.213 eV / V。对于具有两个退火步骤且仅具有一个后退火步骤的器件,相应的亚隙态密度为4.4×10〜(15)和1.6×10〜(16)eV〜(-1)cm〜(-3),分别。

著录项

  • 来源
    《Solid-State Electronics》 |2014年第1期|9-12|共4页
  • 作者单位

    State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China;

    State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China;

    State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China;

    State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China;

    State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China;

    State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China;

    State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Thin-film transistor; IZO; Oxide semiconductor; Anneal;

    机译:薄膜晶体管;伊佐;氧化物半导体;退火;

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