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High temperature performance of AlGaN/GaN HEMTs on Si substrates

机译:硅衬底上的AlGaN / GaN HEMT的高温性能

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摘要

The DC characteristics of AlGaN/GaN HFETs on Si substrates are reported as a function of temperature and gate length. Stable operation up to 500℃ was obtained with no significant permanent degradation. The temperature dependence of the saturation current was found to follow a power law of T~(-1.5) for long channel devices, but improved to show only a weak T~(-0.5) dependence for submicron gate length devices.
机译:据报道,Si衬底上的AlGaN / GaN HFET的DC特性是温度和栅极长度的函数。在高达500℃的温度下仍可稳定运行,且无明显的永久降解。发现对于长沟道器件,饱和电流的温度依赖性遵循T〜(-1.5)的幂定律,但是对于亚微米栅极长度器件,饱和电流的温度依赖性遵循T〜(-1.5)的幂定律,但改善后仅显示出较弱的T〜(-0.5)依赖性。

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