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Analytical model for the programming of source side injection SST superflash split-gate cell using two-dimensional analysis

机译:二维分析的源侧注入SST超快闪分裂栅单元编程的解析模型

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摘要

An analytical model for source side injection programming of E~2PROM is presented based on two-dimensional analysis on SST SuperFlash cells. Owing to SST cells dual-gate specific configuration and programming bias conditions, two maximum peaks are expected in the lateral electric field distribution along the channel. However, only hot electrons generated at the gap region, where the vertical field is in favor of electrons collection can effectively contribute to the gate current. A virtual gate with linearly increased potential is assumed in the gap region to solve the channel electric field distribution. By applying analytical electric field results to the Lucky-Electron model and impact-ionization model, SST cell gate current and substrate current models are derived and verified by experimental data.
机译:基于SST SuperFlash单元的二维分析,提出了一种E〜2PROM源侧注入编程的解析模型。由于SST单元具有双栅极特定配置和编程偏置条件,因此在沿沟道的横向电场分布中预计会有两个最大峰值。但是,只有在垂直电场有利于电子收集的间隙区域产生的热电子才能有效地促进栅极电流。假定在间隙区域中具有线性增加的电势的虚拟栅极以解决沟道电场分布。通过将分析电场结果应用于Lucky-Electron模型和碰撞电离模型,推导并通过实验数据验证了SST单元栅极电流和衬底电流模型。

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