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High resolution transport spectroscopy in ultimate MOSFETs at very low temperature

机译:极低温度下最终MOSFET中的高分辨率传输光谱

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摘要

To analyse electrostatic disorder in doped sub-100 nm Si-MOSFET channels we investigate the sub-threshold regime by transport spectroscopy at very low temperature. We measure resonances in the differential drain current and analyse their distribution in gate voltage, which is found to be gaussian. The mean value is interpreted as the electrostatic charging energy associated to a local well in the surface potential, whose dimensions is comparable to the channel length. The channel dopants concentration does not affect significantly this result.
机译:为了分析掺杂的100 nm以下Si-MOSFET沟道中的静电无序,我们通过非常低的温度下的传输光谱研究了亚阈值范围。我们测量了差分漏极电流中的谐振,并分析了它们在栅极电压中的分布,发现栅极电压是高斯分布。平均值被解释为与表面电势中的局部阱相关的静电电荷能量,其尺寸与沟道长度相当。沟道掺杂剂浓度不会明显影响该结果。

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