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Bias temperature instability mechanisms

机译:偏置温度不稳定性机制

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摘要

Researchers agree on several aspects of NBTI. NBTI is a hole catalyzed reaction that has a pronounced effect on p-channel transistors, and is quite difficult to reduce or eliminate, particularly in devices with short channel lengths. NBTI field dependence is due to the reaction phase, not a field drift component. The damage increases the threshold voltage shift. Interface traps are certainly involved, but there may be another component such as fixed charge as well.
机译:研究人员在NBTI的几个方面达成了共识。 NBTI是一种空穴催化反应,对p沟道晶体管有显着影响,而且很难减少或消除,特别是在沟道长度短的器件中。 NBTI场依赖性是由于反应阶段,而不是场漂移分量。损坏会增加阈值电压偏移。肯定会涉及到接口陷阱,但可能还会有其他成分,例如固定电荷。

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