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首页> 外文期刊>The Kasetsart Journal >Response of Spirulina platensis C1 to High Temperature and High Light Intensity
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Response of Spirulina platensis C1 to High Temperature and High Light Intensity

机译：螺旋藻C1对高温高光强度的响应

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摘要

Response of Spirulina platensis strain C1 to high temperature and high light intensity was studied. Specific growth rate of the S. platensis C1 cells grown in batch cultures at 35℃ with a light intensity of 100 μE/m~2/s was 0.0247 h~(-1). The specific growth rate decreased to 0.008 h~(-1) at 43℃, which was designated to be the critical temperature for this alga strain C1. A suddenly increasing in light intensity from 100 to 500 μE/m~2/s showed an impact to the cell growth, which it had significant affects to photosynthesis (as O_2-evolution) as well as its pigment content (chlorophyll and phycocyanin). However, a less effect on the alga growth was obtained when the cells were shifted to grow at higher temperature of 43℃. The alga cells grown at high temperature with high light intensity resulted in decreasing protein content while carbohydrate content increased. The fatty acid profiles of the cells grown at high temperature exhibited a decrease in polyunsaturated fatty acid (C18:3~(Δ6,9,12)) while C18:2~(Δ9,12) increased. In contrast, the alga cells grown in a high light intensity showed an increase in C18:2~(Δ9,12), while C18:1~(Δ9) and total fatty acid content (TFA) were decreased. On the other hand, the combined effects of temperature and light intensity (43℃, 500 μE/m~2/s) showed that the period of recovery in photosynthesis depends upon the period of exposure to the stress parameter.
机译：研究了螺旋藻C1菌株对高温高光强度的响应。 35℃，100μE/ m〜2 / s的光照强度下分批培养的S. platensis C1细胞的比生长速率为0.0247 h〜（-1）。在43℃时，比生长速率降低到0.008h〜（-1），这被指定为该藻菌株C1的临界温度。光照强度从100μE/ m〜2 / s突然增加表明对细胞生长有影响，这对光合作用（如O_2演化）及其色素含量（叶绿素和藻蓝蛋白）具有显着影响。然而，当细胞在43℃的高温下生长时，对藻类生长的影响较小。在高温下以高光强度生长的藻类细胞导致蛋白质含量降低，而碳水化合物含量增加。在高温下生长的细胞的脂肪酸谱显示出多不饱和脂肪酸（C18：3〜（Δ6,9,12））减少，而C18：2〜（Δ9,12）增加。相反，在高光强度下生长的藻类细胞显示C18：2〜（Δ9,12）增加，而C18：1〜（Δ9）和总脂肪酸含量（TFA）降低​​。另一方面，温度和光强度（43℃，500μE/ m〜2 / s）的综合影响表明，光合作用的恢复期取决于暴露于胁迫参数的时间。

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