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首页> 外文期刊>Thin Solid Films >Synthesis and characterization of (Ti_(1-x)Al_x)B_(2+Δ) thin films from combinatorial magnetron sputtering
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Synthesis and characterization of (Ti_(1-x)Al_x)B_(2+Δ) thin films from combinatorial magnetron sputtering

机译：组合磁控溅射合成（Ti_（1-x）Al_x）B_（2 +Δ）薄膜及表征

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摘要

(Ti1-xAlx)B2+Delta films with a lateral composition gradient of x = [0.30-0.66] and Delta = [0.07-1.22] were deposited on an Al2O3 wafer by dual magnetron sputtering at 400 degrees C from sintered TiB2 and AlB2 targets. Composition analysis indicates that higher Ti:Al ratios favor overstoichiometry in B and a reduced incorporation of O. Transmission electron microscopy reveals distinctly different microstructures of Ti- and Al-rich compositions, with formation of characteristic conical growth features for the latter along with a lower degree of crystallinity and significantly less tissue phase from B segregation at the grain boundaries. For Al-rich films, phase separation into Ti- and Al-rich diboride nanometer-size domains is observed and interpreted as surface-initiated spinodal decomposition. The hardness of the films ranges from 14 to 28 GPa, where the higher values were obtained for the Ti-rich regions of the metal boride.
机译：通过双磁控溅射在400摄氏度下从烧结的TiB2和AlB2靶材上将横向成分梯度为x = [0.30-0.66]和Delta = [0.07-1.22]的（Ti1-xAlx）B2 + Delta膜沉积在Al2O3晶片上。成分分析表明，较高的Ti：Al比值有利于B的化学计量，并减少O的掺入。透射电子显微镜显示，富含Ti和Al的成分具有明显不同的微观结构，并形成了具有特征性的锥形生长特征，而后者具有较低的锥形生长特征。结晶度和明显减少的B相在晶界处的组织相分离。对于富铝薄膜，观察到相分离成富钛和富铝的二硼化物纳米尺寸域，并将其解释为表面引发的旋节线分解。薄膜的硬度范围为14至28 GPa，其中金属硼化物的富钛区域获得了更高的值。

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