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首页> 外文期刊>Thin Solid Films >Microstructured SiO_x thin films deposited from hexamethyldisilazane and hexamethyldisiloxane using atmospheric pressure thermal microplasma jet
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Microstructured SiO_x thin films deposited from hexamethyldisilazane and hexamethyldisiloxane using atmospheric pressure thermal microplasma jet

机译：六甲基二硅氮烷和六甲基二硅氧烷通过大气压热等离子射流沉积的微结构SiO_x薄膜

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摘要

Mictrostructured silicon oxide (SiOx) thin films were deposited on glass and metal substrates from 1,1,1,3,3,3-hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO) by using atmospheric-pressure thermal microplasma jet. Two kinds of string-like products, randomly bent string-like products and linear string-like products, were deposited and they formed microstructured films. The bent string-like products formed labyrinth-like structures and the linear string-like products lay in parallel to form a large aligned structure. The width of both the bent and linear string-like products was from 1 to 3 mu m, regardless of the kind of the precursor but depending on the plasma irradiation conditions. The influence of various surface microstructure of substrates on the formation of the SiOx microstructure was investigated to make clear the mechanism for the formation of the microstructures.
机译：用大气压热等离子射流从1,1,1,3,3,3-六甲基二硅氮烷（HMDSN）和六甲基二硅氧烷（HMDSO）在玻璃和金属基板上沉积微结构化的氧化硅（SiOx）薄膜。沉积两种线状产物，即随机弯曲的线状产物和线性线状产物，它们形成微结构化膜。弯曲的线状产品形成迷宫状结构，而线性的线状产品平行放置以形成大的排列结构。弯曲的和线性的线状产物的宽度都为1至3μm，与前体的种类无关，而是取决于等离子体的照射条件。研究了衬底的各种表面微观结构对SiOx微观结构形成的影响，以弄清微观结构的形成机理。

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