...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Thin Solid Films >Catalytic growth of large area monolayer molybdenum disulfide film by chemical vapor deposition
【24h】

Catalytic growth of large area monolayer molybdenum disulfide film by chemical vapor deposition

机译：化学气相沉积催化生长大面积单层二硫化钼薄膜

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Large area monolayer molybdenum disulfide (MoS2) film grown on silica/silicon substrate was synthesized using a catalyst perylene-3, 4, 9, 10-tetracarboxylic acid tetrapotassium salt (PTAS) by the method of chemical vapor deposition. The properties of the monolayer MoS2 film were characterized using a number of techniques. The optical microscope images show the film is uniform and continuous on a large scale. The 0.7 nm film thickness measured by atomic force microscope, as well as the difference of 20 cm(-1) between the two characteristic Raman peaks, all prove that the film is single layer. The strong photoluminescence spectrum and image as well as the x-ray diffraction indicate that the monolayer MoS2 film has a good quality. The MoS2 film synthesized under the same conditions without PTAS was also characterized as a comparison. The results show that the MoS2 film tends to thicker without using PTAS, suggesting that PTAS can not only promote the formation of the MoS2 seeding, but also induce horizontal growth of the MoS2 film on the substrate.
机译：通过化学气相沉积法，使用using-3、4、9、10-四羧酸四钾盐（PTAS）催化剂，在二氧化硅/硅基底上生长了大面积单层二硫化钼（MoS2）膜。单层MoS2膜的特性使用多种技术进行了表征。光学显微镜图像显示出薄膜是均匀且大规模连续的。用原子力显微镜测得的0.7 nm薄膜厚度以及两个特征拉曼峰之间的差20 cm（-1），都证明该薄膜是单层的。强大的光致发光光谱和图像以及X射线衍射表明单层MoS2膜具有良好的质量。在没有PTAS的相同条件下合成的MoS2膜也作了比较。结果表明，在不使用PTAS的情况下MoS2膜趋于变厚，这表明PTAS不仅可以促进MoS2晶种的形成，而且可以诱导MoS2膜在基板上水平生长。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号