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Structural and optical properties of doped amorphous carbon films deposited by magnetron sputtering

机译：磁控溅射沉积掺杂非晶碳膜的结构和光学性质

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摘要

Amorphous carbon films containing oxygen and bismuth were deposited by direct current magnetron sputtering. The microstructure and optical properties of the films were measured as a function of magnetron sputtering power by atomic force microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, UV-VIS-NIR spectrophotometry, and null-ellipsometry. The oxygen concentration in the films was in the range of 19-21 at.%. It was determined that the deposition rate of amorphous carbon films increased and the surface roughness of the films changed from 1.2 nm to 1.7 nm with the increase of magnetron sputtering power. The microRaman analysis demonstrated that the D band shifted to a lower wavenumbers range and the fraction of the sp(2) carbon sites decreased as the power increased. X-ray photoelectron spectroscopy revealed that sp(3)/sp(2) ratio in the films varied between 0.74 and 0.98. The optical transmission of the films in the visible region was in the range of 60-90%. The optical band gap and the refractive index of the films depend on the dopant concentration and the sp(2) site fraction.
机译：通过直流磁控溅射沉积包含氧和铋的非晶碳膜。通过原子力显微镜，X射线光电子能谱，拉曼光谱，UV-VIS-NIR分光光度法和零椭偏光度法测量了薄膜的微结构和光学性能随磁控管溅射功率的变化。膜中的氧浓度在19-21at。％的范围内。可以确定，随着磁控溅射功率的增加，非晶碳膜的沉积速率增加，并且膜的表面粗糙度从1.2 nm改变为1.7 nm。显微拉曼分析表明，D谱带移至较低的波数范围，并且随着功率的增加，sp（2）碳位的分数降低。 X射线光电子能谱显示，膜中的sp（3）/ sp（2）比在0.74至0.98之间变化。薄膜在可见光区域的透光率在60-90％的范围内。薄膜的光学带隙和折射率取决于掺杂剂浓度和sp（2）部位分数。

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