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Investigation of the effects of bottom anti-reflective coating on nanoscale patterns by laser interference lithography

机译：激光干涉光刻研究底部减反射涂层对纳米图形的影响

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摘要

Enhanced resolution of the structures can be achieved by employing the bottom anti-reflective coating (BARC) material in laser interference lithography process. The purpose of the BARC is to control the reflection of light at the surface of the wafer to minimize the effects caused by reflection. Lloyd's mirror interferometer is utilized for the experiment with 257 nm wavelength Ar-Ion laser used as the light source to generate one-dimensional nanoscale patterns. By adjusting reflectivity through application of the BARC material, scattering of the patterns are reduced. The effects of BARC material are explored to confirm the reduction of the vertical standing wave, which is the main cause of undesirable nanoscale patterns. It is also highlighted that improvements through utilization of BARC material enables smaller pattern size with a set pitch size by controlling the exposure energy.
机译：通过在激光干涉光刻工艺中采用底部抗反射涂层（BARC）材料，可以提高结构的分辨率。 BARC的目的是控制晶片表面的光反射，以最大程度地减少反射引起的影响。劳埃德的反射镜干涉仪用于实验，以257 nm波长的Ar离子激光器为光源，生成一维纳米尺度的图案。通过使用BARC材料来调节反射率，可以减少图案的散射。探索了BARC材料的作用，以确认垂直驻波的减小，这是不良纳米级图案的主要原因。还需要强调的是，通过利用BARC材料的改进可以通过控制曝光能量，以设定的间距尺寸实现更小的图案尺寸。

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  • 来源
    《Thin Solid Films》 |2011年第13期|p.4220-4224|共5页
  • 作者

    Eun-Mi Park; Jinnil Choi; Byung Hyun Kang; Ki-Young Dong; YunKwon Park; In Sang Song; Byeong-Kwon Ju;

  • 作者单位

    Display and Nanosystem Laboratory, College of Engineering, Korea University, Republic of Korea;

    Display and Nanosystem Laboratory, College of Engineering, Korea University, Republic of Korea;

    Display and Nanosystem Laboratory, College of Engineering, Korea University, Republic of Korea;

    Display and Nanosystem Laboratory, College of Engineering, Korea University, Republic of Korea;

    Future IT Center Communication laboratory, Samsung Advanced Institute of Technology, Republic of Korea;

    Future IT Center Communication laboratory, Samsung Advanced Institute of Technology, Republic of Korea;

    Display and Nanosystem Laboratory, College of Engineering, Korea University, Republic of Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    bottom anti-reflective coating; user interference lithography; nanoscale patterning;

    机译：底部抗反射涂层;用户干涉光刻;纳米图案;

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