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首页> 外文期刊>Thin Solid Films >The characteristics of the plasma in a powder sputtering rig
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The characteristics of the plasma in a powder sputtering rig

机译：粉末溅射装置中的等离子体特性

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摘要

The powder sputtering rig was specifically designed for the sputtering of loosely packed blended powder targets. The rig incorporates a single unbalanced magnetron with an additional unpowered dummy magnetron used only to provide a closed magnetic field. Sputtering took place mainly in the pulsed direct current (DC) mode, with continuous DC operation also investigated for comparison purposes. The variations in substrate self-bias potential and substrate ion current with substrate-target separation and target current were studied for varying magnetron configurations. The voltage waveforms at the targets were diagnosed, and the effect of pulse parameters on the deposition rate was investigated. The term 'dead time' has been introduced to explain, in part, the observed decrease in deposition rate with increasing pulse frequency. To demonstrate the advantages of the powder rig, the structure and properties of aluminium-doped zinc oxide coatings deposited under various magnetron configurations and power delivery modes were compared. The results showed that the closed-field configuration and the use of the pulsed DC power supply were two essential factors in this system, which produced defect free, dense columnar coatings with good electrical and optical properties.
机译：粉末溅射设备专门设计用于散装散装的混合粉末靶材的溅射。该设备包含一个不平衡磁控管和一个额外的无动力伪磁控管，仅用于提供闭合磁场。溅射主要在脉冲直流（DC）模式下进行，为了比较目的还研究了连续DC操作。研究了不同磁控管配置下衬底自偏置电势和衬底离子电流随衬底-靶间距和靶电流的变化。诊断靶上的电压波形，并研究脉冲参数对沉积速率的影响。引入了“死时间”一词来部分解释观察到的沉积速率随脉冲频率的增加而降低。为了展示粉末钻机的优势，比较了在各种磁控管配置和功率传输模式下沉积的掺铝氧化锌涂层的结构和性能。结果表明，闭场配置和脉冲直流电源的使用是该系统的两个重要因素，它们产生了无缺陷的致密柱状涂层，具有良好的电学和光学性能。

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  • 来源
    《Thin Solid Films》 |2008年第12期|4030-4035|共6页
  • 作者

    Yanwen Zhou; Peter Kelly; Q.B. Sun;

  • 作者单位

    Surface Engineering Group, Dalton Research Institute, John Dalton Building, Manchester Metropolitan University, Chester Street, Manchester, Ml 5GD, UK School of Material Sciences and Engineering, Liaoning University of Science and Technology, No. 185, Qianshan Rd., Hi-tech District, Anshan, Liaoning, 114044 China;

    Surface Engineering Group, Dalton Research Institute, John Dalton Building, Manchester Metropolitan University, Chester Street, Manchester, Ml 5GD, UK;

    School of Material Sciences and Engineering, Liaoning University of Science and Technology, No. 185, Qianshan Rd., Hi-tech District, Anshan, Liaoning, 114044 China;

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  • 正文语种 eng
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  • 关键词

    pulsed magnetron sputtering; closed-field unbalanced magnetron; powder targets;

    机译：脉冲磁控溅射闭场不平衡磁控管;粉末目标;

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