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首页> 外文期刊>Thin Solid Films >High temperature annealing effects on chromel (Ni90Cr10) thin films and interdiffusion study for sensing applications
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High temperature annealing effects on chromel (Ni90Cr10) thin films and interdiffusion study for sensing applications

机译：铬（Ni90Cr10）薄膜的高温退火效应及传感应用中的互扩散研究

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摘要

Metal embedded thin film thermocouples are very attractive for various applications in harsh environments. One promising technique to embed thin films micro sensors is diffusion bonding, which requires high temperatures and pressures typically in a vacuum. In this study, high temperature annealing effects on chromel (Ni90Cr10) thin film, an important sensor material as one of the components in type K thermocouple, were investigated in a diffusion bonding environment. Annealing was carried out at 800 ℃ for one hour in a diffusion bonder under vacuum without applying pressure. Under such conditions; surface, interface and interdiffusion phenomena were investigated using different characterization techniques including X-ray Diffraction, X-ray Photoelectron Spectroscopy, Scanning Electron Microscopy, and Energy Dispersive Spectroscopy. Results indicate that the present combination of dielectrics is quite reliable and Ni90Cr10 films of 500 nm thickness can be used for applications at least up to 800 ℃ due to a protective thin chromium oxide layer formation on top of the sensor film during annealing.
机译：金属嵌入式薄膜热电偶对于恶劣环境中的各种应用非常有吸引力。嵌入薄膜微传感器的一种有前途的技术是扩散粘合，它通常需要在真空中进行高温和高压。在这项研究中，研究了高温扩散对K1热电偶中重要传感器材料铬（Ni90Cr10）薄膜的影响。在不施加压力的情况下，在真空中于扩散粘合机中于800℃退火1小时。在这种情况下；使用不同的表征技术研究了表面，界面和相互扩散现象，包括X射线衍射，X射线光电子能谱，扫描电子显微镜和能量色散能谱。结果表明，目前的电介质组合是非常可靠的，并且由于退火过程中在传感器膜顶部形成了一层保护性氧化铬薄层，因此厚度为500 nm的Ni90Cr10膜可用于至少800℃的应用。

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  • 来源
    《Thin Solid Films》 |2008年第12期|4307-4311|共5页
  • 作者

    Arindom Datta; Xudong Cheng; Michael A. Miller; Xiaochun Li;

  • 作者单位

    Department of Mechanical Engineering, University of Wisconsin-Madison, 1513 University Avenue, Madison, Wisconsin 53706, USA;

    Department of Mechanical Engineering, University of Wisconsin-Madison, 1513 University Avenue, Madison, Wisconsin 53706, USA;

    Department of Mechanical Engineering, University of Wisconsin-Madison, 1513 University Avenue, Madison, Wisconsin 53706, USA;

    Department of Mechanical Engineering, University of Wisconsin-Madison, 1513 University Avenue, Madison, Wisconsin 53706, USA;

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  • 正文语种 eng
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  • 关键词

    thin films; chromel; annealing; diffusion bonding; interdiffusion; dielectric; materials characterizations;

    机译：薄膜;铬退火;扩散键合相互扩散电介质材料表征;

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