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首页> 外文期刊>Thin Solid Films >Conformal Zno Coatings On High Surface Area Silica Gel Using Atomic Layer Deposition
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Conformal Zno Coatings On High Surface Area Silica Gel Using Atomic Layer Deposition

机译：使用原子层沉积技术在高表面积硅胶上的共形Zno涂层

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摘要

Silica gel is a mesoporous form of silica with a high specific surface area that is widely used as a support material for heterogeneous catalysis. In this study, we use atomic layer deposition (ALD) methods to deposit ZnO layers onto silica gel supports. ZnO ALD was performed using alternating exposures of diethyl zinc (DEZ) and water to coat 1 g quantities of silica gel in a conventional viscous flow reactor. The coated materials were analyzed using weight gain, X-ray fluorescence, X-ray diffraction, energy dispersive X-ray analysis, and scanning and transmission electron microscopy. These measurements revealed that the silica gel support could be conformally coated using reactant exposure times of ～ 90 s. The ALD ZnO was amorphous for films deposited using <5 ALD cycles, but became hexagonal, nanocrystalline ZnO for films deposited using >5 ALD cycles. In addition to the ZnO films, we also discovered that metallic Zn was deposited in the silica gel using very large DEZ exposures and deposition temperatures > 150 ℃. The metallic Zn phase begins to form as soon as the ZnO ALD surface reactions have saturated, indicating that the Zn growth is strongly dependent on the availability of excess DEZ precursor.
机译：硅胶是具有高比表面积的介孔形式的二氧化硅，被广泛用作非均相催化的载体材料。在这项研究中，我们使用原子层沉积（ALD）方法将ZnO层沉积到硅胶载体上。 ZnO ALD使用二乙基锌（DEZ）和水交替暴露以在常规粘性流动反应器中涂覆1 g硅胶进行。使用重量增加，X射线荧光，X射线衍射，能量色散X射线分析以及扫描和透射电子显微镜对涂覆的材料进行分析。这些测量结果表明，使用〜90 s的反应物暴露时间，可以对硅胶载体进行保形涂覆。对于使用小于5个ALD循环沉积的薄膜，ALD ZnO是非晶态的；对于使用大于5个ALD循环沉积的薄膜，ALD ZnO则为六方纳米晶体ZnO。除ZnO膜外，我们还发现使用非常大的DEZ暴露和> 150℃的沉积温度，可在硅胶中沉积金属Zn。一旦ZnO ALD表面反应达到饱和，金属Zn相就开始形成，这表明Zn的生长在很大程度上取决于过量DEZ前体的可用性。

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