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首页> 外文期刊>Thin Solid Films >Improved Stability Of Titanium Based Boron-doped Chemical Vapordeposited Diamond Thin-film Electrode By Modifying titanium Substrate Surface
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Improved Stability Of Titanium Based Boron-doped Chemical Vapordeposited Diamond Thin-film Electrode By Modifying titanium Substrate Surface

机译：通过修饰钛基体表面提高钛基掺硼化学气相沉积金刚石薄膜电极的稳定性

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摘要

The film quality and electrochemical properties of BDD (boron-doped diamond) thin films grown by hot-filament chemical vapor deposition technique on titanium substrates that had been subjected to a range of pre-treatment processes were evaluated. The pre-roughened Ti-substrates are shown to support more adherent BDD films. It is evident that acid-etching the Ti-substrate involves surface hydrogenation that enhances nucleation and formation of diamond thereon. The prepared BDD film exhibits wide potential window and electrochemical reversibility. It also demonstrated a better long-term electrochemical stability based on the low variation in voltametric background current upon the exposing of the electrodes to repeated cycles of electrochemical metal deposition/stripping process.
机译：评估了通过热丝化学气相沉积技术在经过一系列预处理工艺的钛基板上生长的BDD（掺硼金刚石）薄膜的膜质量和电化学性能。预粗糙化的Ti基板显示支持更多的BDD粘附膜。显然，酸腐蚀Ti衬底涉及表面氢化，其增强了成核作用并在其上形成金刚石。制备的BDD薄膜具有宽的电势窗口和电化学可逆性。基于电极暴露于电化学金属沉积/剥离过程的重复循环后，伏安背景电流的低变化，它还显示出更好的长期电化学稳定性。

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