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首页> 外文期刊>Thin Solid Films >Preparation and properties of RF sputtered indium-tin oxide thin films for applications as heat mirrors in photothermal solar energy conversion
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Preparation and properties of RF sputtered indium-tin oxide thin films for applications as heat mirrors in photothermal solar energy conversion

机译：射频溅射铟锡氧化物薄膜的制备及其性能，用作光热太阳能转换中的热镜

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摘要

In the present research, in order to deposit indium-tin oxide (ITO) thin films the method of RF reactive sputtering was used. Sputtering of two types indium-tin targets in the presence of oxygen as reactive gas was made. The technological parameters were optimized to obtain films with good quality on different substrates. The films' microstructure was studied by TEM and SAED. To identify the optical properties of the films the methods of infrared spectrometry and laser ellipsometry were used. UV-VIS spectrophotometry showed the high visible transmittance of the RF sputtered ITO films. Heating of the substrates during the films sputtering and their post deposition thermal treatment also were studied. The ultimate goal of the present research activities was to develop new technological processes leading to low-cost, highly effective optical coatings for application in photo thermal solar energy conversion and utilization.
机译：在本研究中，为了沉积氧化铟锡（ITO）薄膜，使用了RF反应溅射方法。在氧气作为反应气体的存在下溅射两种类型的铟锡靶。优化了工艺参数，以在不同的基材上获得高质量的薄膜。通过TEM和SAED研究了薄膜的微观结构。为了鉴定膜的光学性质，使用了红外光谱法和激光椭圆偏振法。 UV-VIS分光光度法显示了RF溅射ITO膜的高可见光透射率。还研究了薄膜溅射过程中基板的加热及其沉积后的热处理。本研究活动的最终目标是开发新技术工艺，从而开发出低成本，高效光学涂层，用于光热太阳能的转化和利用。

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