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首页> 外文期刊>Thin Solid Films >Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask
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Fabrication of colloidal self-assembled monolayer (SAM) using monodisperse silica and its use as a lithographic mask

机译：使用单分散二氧化硅的胶体自组装单分子膜（SAM）的制备及其作为光刻掩模的用途

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摘要

Monodisperse colloidal silica with controlled sizes (100, 200 and 300 nm) has been prepared by the Stoeber process. The shape and monodispersity of the synthesized colloidal particles were observed by scanning electron microscopy and laser light scattering particle analyzer. Self-assembled monolayer (SAM) of monodisperse colloids was obtained by dipping a Si substrate into a well-dispersed silica suspension. It was found that the uniformity and spatial extent of colloidal SAM were significantly influenced by the experimental parameters such as concentration, pH and surface tension of the colloidal suspension. We have observed a hexagonally well-ordered packing colloidal monolayer in a relatively large area (1.5 X 1.5 mm~2). The platinum was sputtered over the colloidal SAM used as a lithographic mask. This produced a honeycomb-shaped patterned Pt structure of thickness ～60 nm on the Si substrate after the removal of the colloidal silica.
机译：通过斯托伯法已经制备了具有受控尺寸（100、200和300nm）的单分散胶体二氧化硅。通过扫描电子显微镜和激光散射颗粒分析仪观察合成的胶体颗粒的形状和单分散性。单分散胶体的自组装单层（SAM）是通过将Si基板浸入分散良好的二氧化硅悬浮液中而获得的。发现胶体SAM的均匀性和空间范围受胶体悬浮液的浓度，pH和表面张力等实验参数的影响。我们已经在相对较大的区域（1.5 X 1.5 mm〜2）中观察到了六角形排列整齐的填充胶体单层。将铂溅射在用作光刻掩模的胶体SAM上。去除胶体二氧化硅后，在Si衬底上形成厚度约为60 nm的蜂窝状图案化Pt结构。

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