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The surface properties of PS/PMMA blends nanostructured polymeric layers

机译:PS / PMMA的表面性质可与纳米结构聚合物层混合

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摘要

Solvent cast thin films of blends polystyrene (PS) and poly (methylmethacrylate) (PMMA) with nominal compositions ranging from 25/75 wt.%/v% (w/v) up to 75/25 w/v PS/PMMA with toluene as the mutual solvent on crystalline Si (100) and silica substrates has been studied. Films of PS and PMMA blends have been examined by atomic force microscopy (AFM) and ellipsometry. The blend films with less than 50% PMMA bulk concentration generally exhibit pitted surfaces; the pit size varies with film thickness and bulk composition. When the PMMA bulk concentration is greater than 50%, the film surface can be described as island-like phase-separated structure. The surface segregation and morphology are explained in terms of solubility of the two polymers in the solvent and rewetting of PMMA relative to PS.
机译:聚苯乙烯(PS)和聚(甲基丙烯酸甲酯)(PMMA)共混物的溶剂流延薄膜,标称组成范围为25/75 wt。%/ v%(w / v)至75/25 w / v PS / PMMA与甲苯作为结晶硅(100)和二氧化硅衬底上的互溶剂,已经进行了研究。 PS和PMMA混合物的薄膜已通过原子力显微镜(AFM)和椭偏仪进行了检查。 PMMA体积浓度低于50%的共混薄膜通常会出现点蚀的表面。凹坑尺寸随薄膜厚度和整体组成而变化。当PMMA的体积浓度大于50%时,膜表面可以描述为岛状相分离结构。用两种聚合物在溶剂中的溶解度以及PMMA相对于PS的重新润湿来解释表面偏析和形态。

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