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首页> 外文期刊>Thin Solid Films >Spectroscopic ellipsometry study on e-beam deposited titanium dioxide films
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Spectroscopic ellipsometry study on e-beam deposited titanium dioxide films

机译：电子束沉积二氧化钛薄膜的椭圆偏振光谱研究

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摘要

Spectroscopic ellipsometry (SE) was applied to study the optical inhomogeneity of TiO_2 films deposited by the technique of ion-beam assisted e-beam evaporation. A three-sub-layer model of ellipsometry analysis can successfully simulate the structure variation of TiO_2 films, which consists of a dense amorphous layer near the substrate, a crystal columnar layer, and a very thin roughness layer on top. Such a theoretical model is further confirmed by microscopic observations with SEM, TEM, and AFM. The structure variation of TiO_2 films is related to the increase of chamber temperature during the e-beam evaporation process. Annealing evolution of as-deposited TiO_2 films in atmospheric environment at elevated temperatures of 150 and 250℃ was also investigated. The ellipsometry analysis shows that the total film thickness of TiO_2 film increases with the annealing time at both temperatures. A more detailed analysis further reveals that thickness of the top sub-layer increased; whereas the region of the bottom amorphous sub-layer shrunk when the film was annealed at 250℃.
机译：采用椭圆偏振光谱法（SE）研究了离子束辅助电子束蒸发沉积TiO_2薄膜的光学不均匀性。椭圆光度分析的三层模型可以成功地模拟TiO_2薄膜的结构变化，该薄膜由衬底附近的致密非晶层，晶体柱状层和顶部非常薄的粗糙度层组成。通过SEM，TEM和AFM的显微镜观察进一步证实了这种理论模型。 TiO_2薄膜的结构变化与电子束蒸发过程中腔室温度的升高有关。还研究了大气中150和250℃高温下沉积的TiO_2薄膜的退火演变。椭偏分析表明，在两种温度下，TiO_2薄膜的总膜厚均随退火时间的增加而增加。更详细的分析进一步表明，顶层子层的厚度增加了。而在250℃退火时，底层非晶亚层区域收缩。

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