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Reduction of perfluorocompound emissions by microwave plasma-torch

机译：微波等离子体炬减少全氟化合物的排放

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摘要

Perfluorocompounds (PFCs), which have long lifetimes and serious global warming implications, are widely used during plasma etching and plasma-assisted chamber cleaning processes in metal and dielectric film, by chemical vapor deposition (CVD) systems. Surface cleanings are performed within a reduced pressure chamber by making use of PFC gases. These contaminant gases are emitted with nitrogen gas, which are used for vacuum pump purges. In order to destroy all of the global warming gases including PFCs, we have developed a plasma abatement device, an electrodeless atmospheric microwave plasma-torch, which can easily generate plasma at a given atmospheric pressure. The plasma abatement device is attached to the vacuum pump, which discharges the nitrogen gas with contaminants. The abatement was carried out using oxygen and air as additive gases. Destruction and removal efficiency (DRE) of more than 98% was achieved for tetrafluoromethane (CF_4).
机译：全氟化合物（PFC）具有长寿命和严重的全球变暖影响，已通过化学气相沉积（CVD）系统在金属和介电膜的等离子蚀刻和等离子辅助腔室清洗过程中广泛使用。通过使用PFC气体在减压室内进行表面清洁。这些污染物气体与氮气一起排放，用于真空泵清洗。为了销毁包括PFC在内的所有全球变暖气体，我们开发了一种等离子体消除装置，一种无电极的大气微波等离子体炬，可以在给定的大气压下轻松产生等离子体。等离子体消除装置安装在真空泵上，该真空泵排出带有污染物的氮气。使用氧气和空气作为添加气体进行减排。四氟甲烷（CF_4）的销毁和去除效率（DRE）达到98％以上。

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