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Simple and Versatile Analytical Method for Monitoring the Deposition of Thin Layers by Optical Measurement and Calculation of Residual Stress

机译:通过光学测量监测薄层沉积的简单和多功能分析方法,以及残余应力计算

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This paper develops a simple and versatile analytical method for characterizing residual stress associated with the deposition of thick, thin, single and multilayer coatings. This study is of great importance, since the generation of residual stress can lead to the formation of significant defects in the coating. To illustrate the effectiveness of our analytical method, two different processes were characterized. The coatings formed are intended for anti-corrosion applications. The first is a Physical Vapour Deposition (PVD) involving a High Power Impulsed Magnetron Sputtering (HiPIMS), the second is a sol-gel process. The approach is based on the optical recording of the curvature of a thin substrate, followed by its assessment using a fit of the digitalized image by a parametric model. The results provide experimental data on the development of stress during deposition. Both coatings studied have a low level of residual stress, which explains why they are flawless and which is interesting for the targeted anti-corrosion application. For the PVD coating, it was possible to link the development of the stress to the evolution of the film structure during growth. For the sol-gel process, the study of the stress allowed us to highlight the drying reaction mechanisms involved during the sol-gel transition and their influence on the gel structure.
机译:本文开发了一种简单而通用的分析方法,用于表征与厚,薄,单层涂层沉积相关的残余应力。本研究具有重要意义,因为残留应力的产生可能导致涂层中的显着缺陷。为了说明我们分析方法的有效性,表征了两种不同的过程。形成的涂层用于防腐蚀应用。第一是涉及高功率脉冲磁控溅射(Hipims)的物理气相沉积(PVD),第二是溶胶 - 凝胶工艺。该方法基于薄基板的曲率的光学记录,然后使用参数模型使用数字化图像的拟合进行评估。结果为沉积期间应力的发展提供了实验数据。两种涂层都有低水平的残余应力,这解释了为什么它们是完美的,这对目标防腐应用有趣。对于PVD涂层,可以将应力的显影连接到生长期间膜结构的进化。对于溶胶 - 凝胶工艺,对应力的研究使我们突出了在溶胶 - 凝胶过渡期间所涉及的干燥反应机制及其对凝胶结构的影响。

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