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Synthesis of titanium disulfide films

机译:二硫化钛薄膜的合成

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摘要

The effect of synthesis conditions upon composition and structure of titanium disulfide films has been investigated. The films were synthesized on the titanium surface free from oxides. It has been established that thin films synthesized at 700-850℃ are characterized by manifastation of a-texture, which becomes weak or quite dissapears when synthesis is carried out under low pressure of sulfur in the reactor volume, under annealing and also when films are formed repeatedly.
机译:研究了合成条件对二硫化钛薄膜组成和结构的影响。该膜在不含氧化物的钛表面上合成。已经确定,在700-850℃合成的薄膜的特征在于a-纹理的固定性,当在反应器容积中的低硫压力下,在退火下以及当薄膜在反复形成。

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