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3,3 '-4,4 '-dimethoxy-2,2 '-bipyrroles: Highly electron-rich model compounds for polypyrrole formation

机译:3,3'-4,4'-二甲氧基-2,2'-联吡咯:高度电子富集的聚吡咯形成模型化合物

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摘要

3,3'-Dimethoxy-2,2'-bipyrrole (1) and 4,4'-dimethoxy-2,2'-bipyrrole (2) were obtained in short sequences and good yields from N-benzyl-3-hydroxy-pyrrole-2,4-dicarboxylic acid. The key intermediate leading to 1 is an N-benzyl-3-methoxypyrrole, which is dimerized by lithiation and oxidation with NiCl2. The formation of 2 is achieved by a classical Ullmann coupling of diethyl 1-benzyl-2-bromo-4-methoxypyrrole-3,5-dicarboxylate. The N-benzyl protection groups of 1 and 2 are cleaved under reducing conditions with sodium in liquid ammonia. Both isomeric bipyrroles are extremely sensitive toward air. Compound 1 has a very low oxidation potential of 0.09 V against AgCl but film formation hardly occurs. On the other hand, compound 2 with a potential of 0.35 V readily forms stable polypyrrole films with anodic waves at -0.51 and -0.35 V and a cathodic wave at -0.77 V the lowest potential ever observed for a p-doped polymer. [References: 42]
机译:N,苄基-3-羟基-以短序列获得了3,3'-二甲氧基-2,2'-联吡咯(1)和4,4'-二甲氧基-2,2'-联吡咯(2)。吡咯-2,4-二羧酸。导致1的关键中间体是N-苄基-3-甲氧基吡咯,其通过锂化和用NiCl2氧化而二聚。 2的形成是通过1-苄基-2-溴-2-溴-4-甲氧基吡咯-3,5-二羧酸二乙酯的经典Ullmann偶联实现的。 1和2的N-苄基保护基在还原条件下用钠在液态氨中的裂解。两种异构的双吡咯对空气极为敏感。化合物1相对于AgCl具有0.09V的非常低的氧化电位,但是几乎不发生膜形成。另一方面,具有0.35V电势的化合物2容易形成稳定的聚吡咯膜,其具有在-0.51和-0.35V的阳极波和在-0.77V的阴极波,这是对p掺杂的聚合物所观察到的最低电势。 [参考:42]

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