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Semitransparent CVD diamond detectors for in situ synchrotron radiation beam monitoring

机译：半透明CVD金刚石探测器，用于原位同步辐射辐射束监测

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摘要

Chemically vapour-deposited (CVD) diamond thin films have been used for X-ray beam monitoring. Advances in experiments using synchrotron light sources have generated a demand for permanent in-line radiation hard X-ray monitors in the energy range1.5-25 keV. CVD diamond has two distinct advantages over all other detector materials: it has a low atomic number resulting in a low X-ray absorption cross-section and it exhibits a high radiation and temperature hardness allowing long term operation.This combination enables thin-film photodetectors to be inserted in the beam line causing only low level intensity perturbations downstream.Diamond membranes 20μm thick were grown on silicon using the microwave plasma CVD technique. Four-quadrant position-sensitive devices were fabricated on CVD diamond using other low atomic number materials such as graphite and aluminium for contactformation. Positional analysis of 4 keV photons from a third generation synchrotron radiation facility (ESRF) under typical operating conditions (10{sup}12-10{sup}13 photons cm{sup}2 s{sup}-1) has demonstrated a spatial resolution of 2μm over a 200μm×200μm area with 80% transmission remaining. For demanding experiments such as XAFS, this feature allows real time monitoring of beam instabilities and therefore simultaneous position correction during data acquisition.
机译：化学气相沉积（CVD）金刚石薄膜已用于X射线束监控。使用同步加速器光源的实验进展已经产生了对能量范围为1.5-25 keV的永久在线辐射硬X射线监测仪的需求。 CVD金刚石比其他所有探测器材料具有两个明显的优势：它具有低原子序数，导致低的X射线吸收截面，具有高辐射强度和高温硬度，可长期运行，从而使薄膜光电探测器成为可能。微波等离子体CVD技术在硅上生长了20μm厚的金刚石膜。使用其他低原子序数材料（例如石墨和铝）在CVD金刚石上制造四象限位置敏感器件，以进行接触形成。在典型操作条件下（10 {sup} 12-10 {sup} 13个光子cm {sup} 2 s {sup} -1）对来自第三代同步加速器辐射设施（ESRF）的4 keV光子的位置分析显示了空间分辨率在200μm×200μm的面积上为2μm，剩余80％的透射率。对于要求苛刻的实验（例如XAFS），此功能允许实时监视光束不稳定性，因此可以在数据采集期间同时进行位置校正。

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