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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >The glass transition temperature of silicate and borate glasses
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The glass transition temperature of silicate and borate glasses

机译：硅酸盐和硼酸盐玻璃的玻璃化转变温度

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The dependence of the glass transition temperature on silicate composition as well as on borate composition is discussed. Some new experimental results on borosilicate glass-enamels are put together with the existing literature data. It is demonstrated that in the glass transition interval the activation energy E(T-g) for viscous flow is related to the glass transition temperature. The activation energy for viscous flow is given by E(T-g) = 260T(g) +/- 10% [J/mol]. In the case of silicates, the glass transition temperature decreases almost linearly with the molar fraction x of network modifier, NM. In the interval 0.01 < x < 0.6 the glass transition temperature is:T-g(x) = (1080 - 626x) +/- 5% [K] for (Na2O + MgO)(x)(Al2O3 + SiO2)(1-x)T-g(x) = (967 - 626x) +/- 5% [K] for (PbO)(x)(SiO2)(1-x)T-g(x) = (895 - 626x) +/- 5% [K] for (Na2O)(x)(SiO2)(1-x)This is easily explained assuming that viscous flow is controlled by the motion of SiO4 tetrahedra with one oxygen bridge already broken. In the same time the alkaline cations impose some spatial hindrance, therefore, larger is the cation the higher is the hindrance. The composition, x, dependence of the glass transition temperature of borates is more complicated. It has a maximum at about 30% of network modifier. This happens because introduction of NM changes borate structure from one consisting of BO3 triangles sharing edges to BO4 tetrahedra similar to SiO4 tetrahedra in silicates. (c) 2005 Elsevier B.V. All rights reserved.
机译：讨论了玻璃化转变温度对硅酸盐组成以及硼酸盐组成的依赖性。硼硅酸盐玻璃搪瓷的一些新实验结果与现有文献数据结合在一起。结果表明，在玻璃化转变间隔中，粘性流动的活化能E（T-g）与玻璃化转变温度有关。粘性流的活化能由E（T-g）= 260T（g）+/- 10％[J / mol]给出。在硅酸盐的情况下，玻璃化转变温度几乎随网络改性剂NM的摩尔分数x线性降低。对于（Na2O + MgO）（x）（Al2O3 + SiO2）（1-x），在0.01

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