The thin film of tin oxide was formed in the solution containing 0.005-0.3 mol/l SnF2. The procedure of film formation was very simple; the solution, in which a substrate is immersed, is maintained above 40 degrees C for tens of hours. In this method, the hydrolysis product of SnF2 deposited as the film on a substrate. As-deposition film included 6-16 mol% fluorine. The chemical component was deduced as SnO2-05xFx, where 0.17 展开▼
机译：在含有0.005-0.3mol / l SnF 2的溶液中形成氧化锡薄膜。成膜的过程非常简单。将浸有基材的溶液保持在40摄氏度以上数十小时。在该方法中，SnF 2的水解产物以薄膜形式沉积在基底上。沉积膜包含6-16摩尔％的氟。化学成分推定为SnO2-05xFx，其中0.17 展开▼
