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首页> 外文期刊>Colloids and Surfaces, A. Physicochemical and Engineering Aspects >Fabrication of nanofins of TiO2 and other metal oxides via the surface sol-gel process and selective dry etching
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Fabrication of nanofins of TiO2 and other metal oxides via the surface sol-gel process and selective dry etching

机译：通过表面溶胶-凝胶工艺和选择性干法刻蚀制备TiO2和其他金属氧化物的纳米鳍片

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摘要

We herein report the fabrication of nanofins of TiO2 and other metal oxides via photolithography and the surface sol-gel process. A photolithographically fabricated line template on a silicon wafer was coated with a metal oxide nanolayer by the surface sol-gel process. In this study, TiO2, ZrO2, HfO2, SiO2/TiO2 and were employed as coating materials. Then, the topmost portion of the coating layer and the template were successively removed using CHF3 and oxygen plasma, respectively, leaving the sidewalls of the meal oxide layers remaining on the substrate. These fins were self-supporting, and the composition and the inner layer structure of metal oxide walls were controlled by changing the materials and the coating sequence. In the case of TiO2, the height/width ratio of the fin was 13.2 at the 30-cycle coating and is surprisingly high when compared to that of the conventional photolithography processes.
机译：我们在此报告了通过光刻和表面溶胶-凝胶工艺制备的TiO2和其他金属氧化物的纳米鳍片。通过表面溶胶-凝胶法在硅晶片上进行光刻制造的线模板涂覆有金属氧化物纳米层。在这项研究中，TiO2，ZrO2，HfO2，SiO2 / TiO2被用作涂料。然后，分别使用CHF3和氧等离子体依次除去涂层的最上层部分和模板，使粉状氧化物层的侧壁保留在基材上。这些鳍片是自支撑的，并且通过改变材料和涂覆顺序来控制金属氧化物壁的组成和内层结构。在TiO2的情况下，鳍片的高/宽比在30个循环的涂层中为13.2，与传统的光刻工艺相比，其高/低令人惊讶。

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