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首页> 外文期刊>Applied optics >Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering
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Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering

机译：离子束溅射沉积的用于深紫外光学器件的氟化物减反射涂层

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Optically high quality coatings of fluoride materials are required in deep ultraviolet (DUV) lithography. We have applied ion-beam sputtering (IBS) to obtain fluoride films with smooth surfaces. The extinction coefficients were of the order of 10~(-4) at the wavelength of 193 nm due to the reduction of their absorption loss. The transmittance of the MgF_(2)/GdF_(3) antireflection coating was as high as 99.7percent at the wavelength of 193 nm. The surfaces of the IBS deposited films were so smooth that the surface roughness of the AlF_(3)/GdF_(3) film was comparable with that of the CaF_(2) substrate. The MgF_(2)/GdF_(3) coating fulfilled the temperature and humidity requirements of military specification. Thus, the IBS deposited fluoride films are promising candidate for use in the DUV lithography optics.
机译：在深紫外（DUV）光刻中需要使用氟化物材料的光学高质量涂层。我们已经应用离子束溅射（IBS）来获得表面光滑的氟化物膜。由于其吸收损耗的降低，消光系数在193 nm波长处约为10〜（-4）。 MgF_（2）/ GdF_（3）减反射膜的透射率在193 nm的波长下高达99.7％。 IBS沉积膜的表面是如此光滑，以至于AlF_（3）/ GdF_（3）膜的表面粗糙度可与CaF_（2）基板的表面粗糙度相比。 MgF_（2）/ GdF_（3）涂层满足军事规格的温度和湿度要求。因此，IBS沉积的氟化物膜有望用于DUV光刻光学器件。

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