Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio

Denis Garoli; F. Frassetto; G. Monaco; P. Nicolosi; M.-G. Pelizzo; F. Rigato; V. Rigato; A. Giglia; S. Nannarone

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Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio

机译：具有不同C / Si比的SiC的反射率测量和极端紫外-真空紫外区的光学常数

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Reflectance versus incidence angle measurements have been performed from 5 to 152 nm on samples of SiC with a different C/Si ratio deposited with rf magnetron sputtering. The optical constants of the material at different wavelengths have been determined by using a curve-fitting technique of reflectance values versus incidence angle. Complementary measurements of the incident beam polarization, film thickness, surface roughness, and stoichiometry were performed to complete the analysis of the samples.

机译：已经对通过射频磁控溅射沉积的具有不同C / Si比的SiC样品从5到152 nm进行了反射率与入射角的测量。通过使用反射率值与入射角的曲线拟合技术，可以确定材料在不同波长下的光学常数。对入射光束的偏振，膜厚，表面粗糙度和化学计量进行了补充测量，以完成对样品的分析。

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《Applied optics》 |2006年第22期|共9页
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Denis Garoli; F. Frassetto; G. Monaco; P. Nicolosi; M.-G. Pelizzo; F. Rigato; V. Rigato; A. Giglia; S. Nannarone;
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1. Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio [J] . Denis Garoli, F. Frassetto, G. Monaco, Applied Optics . 2006,第22期

机译：不同C / Si比的SiC在极端紫外-真空紫外区的反射率测量和光学常数
2. Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg_(2)Si, and InSb and of evaporated Cr [J] . Juan I. Larruquert, Ritva A. M. Keski-Kuha Applied optics . 2000,第16期

机译：离子束沉积SiC，Mo，Mg_（2）Si和InSb以及蒸发的Cr薄膜的极紫外反射率测量和光学常数
3. Reflectance measurements on clean surfaces for the determination of optical constants of silicon in the extreme ultraviolet-soft-x-ray region [J] . Soufli R, Gullikson EM Applied optics . 1997,第22期

机译：在干净的表面上进行反射率测量，以确定极端紫外线-软X射线区域中硅的光学常数
4. Effect of oxygen atom bombardment on the reflectance of SiC mirrors in the extreme-ultraviolet region [C] . John F. Seely, G.E. Holland, William R. Hunter, Conference on ultraviolet technology . 1993

机译：氧原子轰炸对极端紫外地区SiC镜子反射率的影响
5. Reflectance-based optical diagnosis of epithelial pre-cancer: Modeling spectroscopic measurements, fiber-optic probe design considerations, and analysis of tissue micro-optical properties. [D] . Arifler, Dizem. 2005

机译：基于反射的上皮癌前病变的光学诊断：建模光谱测量，光纤探针设计注意事项以及组织微光学特性分析。
6. Effects of assuming constant optical scattering on haemoglobin concentration measurements using NIRS during a Valsalva Manoeuvre [O] . Lei Gao, Clare E. Elwell, Matthias Kohl-Bareis, -1

机译：假设持续光散射对瓦尔萨尔瓦（Valsalva）机动期间使用NIRS进行的血红蛋白浓度测量的影响
7. Charge exchange recombination spectroscopy measurements in the extreme ultraviolet region of central carbon concentrations during high power neutral beam heating in TFTR (Tokamak Fusion Test Reactor) [O] . B.C. Stratton, R.J. Fonck, A.T. Ramsey, 1989

机译：在TFTR（TOKAMAK融合测试反应器中的高功率中性光束加热期间，电荷交换重组光谱测量中央碳浓度的极端紫外区域
8. Charge Exchange Recombination Spectroscopy Measurements in the Extreme Ultraviolet Region of Central Carbon Concentrations during High Power Neutral Beam Heating in TFTR (Tokamak Fusion Test Reactor). [R] . Stratton, B. C., Fonck, R. J., Ramsey, A. T., 1989

机译：TFTR（托卡马克聚变试验反应堆）高功率中性束加热过程中中心碳浓度极紫外区的电荷交换重组光谱测量。

Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio

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