An alternative phase-extraction methodology is presented for high-resolution moire analysis, in which the projected and imaged pattern is imaged by a charge-coupled device (CCD) array relatively spaced at three pixels per period. The profilometric method uses a photolithographically printed binary pattern with a 33.3% duty cycle symmetrically projected and imaged using telecentric lenses. The resulting surface height map reduces phase error by 33% when compared to conventional sinusoidal projection and extraction methods. The presented system has the ability to resolve surface features with a lateral resolution of <50 mu m and a topographical resolution <10 mu m. (C) 2015 Optical Society of America
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