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首页> 外文期刊>Applied optics >Extended x-ray absorption fine structure measurements on asymmetric bipolar pulse direct current magnetron sputtered Ta2O5 thin films
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Extended x-ray absorption fine structure measurements on asymmetric bipolar pulse direct current magnetron sputtered Ta2O5 thin films

机译：非对称双极脉冲直流磁控溅射Ta2O5薄膜的扩展x射线吸收精细结构测量

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摘要

Tantalum pentoxide (Ta2O5) thin films have been deposited on fused silica substrates using a novel asymmetric bipolar DC magnetron sputtering technique under a mixed ambient of oxygen and argon. Films have been prepared at different oxygen-to-argon ratios, and the sputtering ambient and optical properties of the films have been investigated by spectroscopic ellipsometry, while the structural analysis of the films has been carried out by grazing incidence x-ray diffraction and extended x-ray absorption fine structure (EXAFS) measurements. The concentration of oxygen and tantalum in the Ta2O5 films has been estimated by Rutherford backscattering spectrometry (RBS). The variation of the optical constants of the films with changes in deposition parameters has been explained in the light of the change in average Ta-O bond lengths and oxygen coordination around Ta sites as obtained from EXAFS measurements. The trend in variation of the oxygen-to-tantalum ratio in the films obtained from RBS measurement, as a function of oxygen partial pressure used during sputtering, is found to follow the trend in variation of the oxygen coordination number around Ta sites obtained from EXAFS measurement. (C) 2015 Optical Society of America
机译：在氧气和氩气的混合环境下，使用新颖的不对称双极直流磁控溅射技术，在熔融石英基板上沉积了五氧化二钽（Ta2O5）薄膜。制备了不同氧/氩比的薄膜，并通过光谱椭圆偏振法研究了薄膜的溅射环境和光学性能，同时通过掠入射X射线衍射对薄膜的结构进行了分析并扩展了其结构。 X射线吸收精细结构（EXAFS）测量。 Ta2O5薄膜中的氧气和钽的浓度已通过卢瑟福背散射光谱法（RBS）进行了估算。薄膜的光学常数随沉积参数的变化而变化，这是根据从EXAFS测量获得的平均Ta-O键长度的变化和Ta位周围的氧配位关系来解释的。发现通过RBS测量获得的薄膜中氧与钽之比的变化趋势随溅射过程中所用的氧分压而变化，该趋势遵循从EXAFS获得的Ta位附近的氧配位数变化趋势。测量。 （C）2015年美国眼镜学会

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