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A Supramolecular Approach to Photoresponsive Thermo/Solvoplastic Block Copolymer Elastomers

机译:超分子方法制备光响应性热/溶剂型嵌段共聚物弹性体

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With the aim of preparing supramolecular photoresponsive block copolymer elastomers, a series of ABA triblock copolymers with a poly(n-butyl acrylate) (PnBA) middle block and poly-(dimethylaminoethyl methacrylate) (PDMAEMA or PDM) outer blocks were synthesized by atom transfer radical polymerization (ATRP), followed by PDM quaternization (giving PDMQ-PnBA-PDMQ) and then by ionic complexation with methyl orange (MO), an azo-containing and sulfonate-functionalized commercially available compound (giving PDMQ/MO-PnBA-PDMQ/MO). The PnBA block, which has a subambient glass transition, and the quaternized and complexed blocks, which have high glass transitions, form phase-separated soft and hard blocks, respectively. Simple elasticity tests of solvent-cast films show that the PDMQ/MO-PnBA-PDMQ/MO with hard block content between 18 and 29 wt % (as well as PDMQ-PnBA-PDMQ with 18 wt % hard block content) have significant elastomeric character. AFM and TEM (atomic force and transmission electron microscopies) of spin-coated films show a correlation between the elastomeric character and morphologies where the hard block forms a dispersed minority phase (spherical and/or short cylindrical domains). A continuous hard phase is observed for a hard block content of around 37 wt %; these materials show no significant elasticity. Reversible photoisomerization, with relatively high cis isomer content in the photostationary state, was also demonstrated.
机译:为了制备超分子光响应嵌段共聚物弹性体,通过原子转移合成了一系列具有聚丙烯酸正丁酯(PnBA)中间嵌段和聚甲基丙烯酸二甲氨基乙基酯(PDMAEMA或PDM)外嵌段的ABA三嵌段共聚物。自由基聚合(ATRP),然后进行PDM季铵化(得到PDMQ-PnBA-PDMQ),然后与甲基橙(MO)进行离子络合,甲基橙是一种含偶氮和磺酸盐官能化的市售化合物(给出PDMQ / MO-PnBA-PDMQ / MO)。具有近乎玻璃化转变的PnBA嵌段,以及具有高玻璃化转变的季铵化和络合的嵌段分别形成相分离的软嵌段和硬嵌段。溶剂浇铸膜的简单弹性测试表明,硬嵌段含量在18至29 wt%之间的PDMQ / MO-PnBA-PDMQ / MO(以及硬嵌段含量在18 wt%的PDMQ-PnBA-PDMQ)具有显着的弹性字符。旋涂膜的AFM和TEM(原子力和透射电子显微镜)显示出弹性特征和形态之间的相关性,其中硬嵌段形成分散的少数相(球形和/或短圆柱域)。观察到连续的硬质相的硬嵌段含量为约37重量%;这些材料没有明显的弹性。还证明了在光平稳状态下具有相对较高的顺式异构体含量的可逆光异构化。

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