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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Photocatalytic Degradation of RhB over TiO_2 Bilayer Films: Effect of Defects and Their Location
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Photocatalytic Degradation of RhB over TiO_2 Bilayer Films: Effect of Defects and Their Location

机译：TiO_2双层膜上RhB的光催化降解：缺陷及其位置的影响

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摘要

TiO_2 bilayer films with a normal surface (Ns-TiO_2), surface defects (Sd-TiO_2), and interface defects (Id-TiO_2) were successfully prepared by a combination of cold plasma treatment (CPT) and sol?gel dip-coating technology. The photodegradation of rhodamine B (RhB) over these as-prepared TiO_2 films was investigated via UV?vis irradiation. Results indicate that the three kinds of films exhibit very different photodegradation processes for RhB. A mainly N-deethylation reaction over the Ns-TiO_2 films, whereas an efficient degradation (cycloreversion) of RhB occurs over the Sd-TiO_2 films. In the RhB/Id-TiO_2 system, however, efficient N-deethylation concomitant with the highly efficient cycloreversion of RhB is observed. The efficiency of the complete mineralization of RhB dye follows the order of Id-TiO_2 > Sd-TiO_2 > Ns-TiO_2. It is proposed that the defect sites at the surface or the interface of TiO_2 films promote the separation of photogenerated electron?holes, leading to a higher photoactivity of defective TiO_2 films. Moreover, the higher stability over Id-TiO_2 as compared to Sd-TiO_2 indicates that the interface defect sites in TiO_2 could be applied in environmental photocatalysis.
机译：结合冷等离子处理（CPT）和溶胶凝胶浸涂技术成功制备了具有正表面（Ns-TiO_2），表面缺陷（Sd-TiO_2）和界面缺陷（Id-TiO_2）的TiO_2双层薄膜。通过紫外可见光谱研究了这些制备的TiO_2薄膜上若丹明B（RhB）的光降解。结果表明，这三种薄膜对RhB的光降解过程非常不同。在Ns-TiO_2膜上主要发生N-脱乙基反应，而在Sd-TiO_2膜上发生RhB的有效降解（环还原）。然而，在RhB / Id-TiO_2系统中，观察到有效的N-脱乙基化与RhB的高效环还原。 RhB染料完全矿化的效率遵循Id-TiO_2> Sd-TiO_2> Ns-TiO_2的顺序。提出TiO_2薄膜表面或界面处的缺陷部位促进了光生电子空穴的分离，从而导致缺陷TiO_2薄膜的光活性更高。此外，与Sd-TiO_2相比，其在Id-TiO_2上的更高稳定性表明TiO_2中的界面缺陷位点可用于环境光催化。

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