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The adsorption of In on the surface of (001) CdTe

机译:In在(001)CdTe表面的吸附

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摘要

To understand CdTe doping with In, first-principle calculations are performed to obtain the various kinds of surface-structure for In on CdTe (001) surface. Of all the structures examined, the structure of CdTe (001) as caused by In adsorption atoms at the fourfold hollow sites with 0.25 monolayer coverage is the most energetically favorable. In atoms are adsorbed on the Cd-terminated surface, whereas below the Te-terminated surface. For the Cd-terminated surface, cadmium vacancy can form spontaneously and is energetically favorable. In atoms are likely to be adsorbed/incorporated at an interstitial site on Te-terminated CdTe (001) surfaces for most of the range of the chemical potential.
机译:为了理解使用In掺杂CdTe,进行第一性原理计算以获得CdTe(001)表面上In的各种表面结构。在所有检查的结构中,CdTe(001)的结构是由In吸附原子在具有0.25个单层覆盖率的四个中空位置处引起的,在能量上最为有利。 In原子吸附在Cd末端的表面上,而在Te末端的表面以下。对于Cd终止的表面,镉空位会自发形成,并且在能量上是有利的。在大多数化学势范围内,In原子很可能会在Te端CdTe(001)表面的间隙位置被吸附/结合。

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