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首页> 外文期刊>Journal of Applied Polymer Science >Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same
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Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same

机译：脂环族聚合物的合成及其化学放大正性光刻胶的表征

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摘要

To investigate the effects of cyclic structures of polymers on the physical properties of photoresist, a series of copolymers consisting of various comonomers selected from 3,6-endo,oxo-1,2,3,6-tetrahydrophthalic anhydride (THPA), bornyl methacrylate (BMA), methacrylic acid (MA), t-butyl methacrylate (t-BMA), and 2-norborene (NB) was synthesized. The molecular weight, glass transition temperature, and the components of the synthesized copolymers were estimated. Photoresists consisting of the synthesized polymers and photoacid generator were prepared. The dependence of the molecular structures on the developers was investigated. The exposure characteristic curves of the photoresists were studied. The existence of the alicyclic comonomers was clearly found to increase the plasma resistance of the photoresist. The sensitivity, contrast, and exposed real image of the prepared photoresists were all investigated. The results obtained suggest that the alicyclic polymers synthesized in this investigation could be used as positive tone photoresists. (c) 2005 Wiley Periodicals, Inc.
机译：为了研究聚合物的环状结构对光致抗蚀剂的物理性能的影响，一系列由各种共聚单体组成的共聚物，这些共聚单体选自3,6-内基，氧代-1,2,3,6-四氢邻苯二甲酸酐（THPA），甲基丙烯酸冰片酯合成了（BMA），甲基丙烯酸（MA），甲基丙烯酸叔丁酯（t-BMA）和2-降冰片烯（NB）。估算了分子量，玻璃化转变温度和合成共聚物的组分。制备了由合成聚合物和光致产酸剂组成的光致抗蚀剂。研究了分子结构对显影剂的依赖性。研究了光刻胶的曝光特性曲线。清楚地发现脂环族共聚单体的存在增加了光刻胶的耐等离子体性。所制备的光致抗蚀剂的灵敏度，对比度和曝光后的真实图像均得到了研究。获得的结果表明，在该研究中合成的脂环族聚合物可以用作正性光致抗蚀剂。 （c）2005年Wiley Periodicals，Inc.

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