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首页> 外文期刊>Journal of Applied Polymer Science >Photoinduced mesoporosity of Tert-butoxycarbonyl acrylic photosensitive material with low dielectric constant
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Photoinduced mesoporosity of Tert-butoxycarbonyl acrylic photosensitive material with low dielectric constant

机译：低介电常数的叔丁氧羰基丙烯酸光敏材料的光致介孔

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摘要

We have developed a photosensitive system having low dielectric constant with mesoporous. The photosensitive system we developed is patternable and the mesoporosity is generated through the combination of photo exposure and thermal treatment. The mesopores were formed in a photosensitive material to reduce its dielectric constant. Tert-butoxycarbonyl (t-BOC) containing acrylic copolymer was activated as a photosensitive material via photochemical reactions. Iodonium salt as a photo acid generator was exposed to ultraviolet light with a wavelength of under 365 nm to form the corresponding Lewis acid. The side chains of t-BOC were cleaved by this Lewis acid to yield isobutylene and acrylic acid groups. The small molecules thus formed were further heated in the polymer matrix to generate mesopores. Notably, the t-BOC content and heat affect the dimensions and number of mesopores. The dielectric constant decreased as the density of mesopores increases. The formation of mesopores was observed by transmission electron microscope and scanning electron microscopy. We have also studied the mechanisms of formation of mesopores and their effects on the dielectric constant.
机译：我们已经开发了具有低介电常数和介孔的光敏体系。我们开发的光敏系统是可图案化的，中孔是通过光敏曝光和热处理相结合而产生的。中孔在光敏材料中形成以减小其介电常数。含有叔丁氧羰基（t-BOC）的丙烯酸共聚物通过光化学反应被活化为光敏材料。将碘鎓盐作为光生酸剂，暴露于波长小于365 nm的紫外线下，形成相应的路易斯酸。 t-BOC的侧链被该路易斯酸裂解，得到异丁烯和丙烯酸基团。如此形成的小分子在聚合物基质中进一步加热以产生中孔。值得注意的是，t-BOC含量和热量会影响中孔的尺寸和数量。介电常数随着中孔密度的增加而降低。通过透射电子显微镜和扫描电子显微镜观察中孔的形成。我们还研究了中孔的形成机理及其对介电常数的影响。

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