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首页> 外文期刊>The European physical journal, D. Atomic, molecular, and optical physics >Numerical simulation of evolution features of the atmospheric-pressure CF4 plasma generated by the pulsed dielectric barrier discharge
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Numerical simulation of evolution features of the atmospheric-pressure CF4 plasma generated by the pulsed dielectric barrier discharge

机译：脉冲介电阻挡放电产生的大气压CF4等离子体的演化特征的数值模拟

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摘要

The atmospheric-pressure CF4 plasma has the high application potential in the field of semiconductor fabrication since it can combine the excellent capability for the CF4 plasma etching with the easy atmospheric-pressure operation. In this work, the fluid model has been carried out to numerically research evolution features of the atmospheric-pressure CF4 plasma generated by the pulsed dielectric barrier discharge. The computational results show that the averaged electron temperature dramatically increases during the rising and the falling phases of the applied voltage pulse, and then swiftly decreases. The discharge current density has the waveform of two bipolar short pulses. The electrons and CF3+ ions form the cathode sheath at the discharge duration. However, the CF3- and F-negative ions take the place of the electrons to sustain the cathode sheath of the CF4 discharge plasma at the time interval between the two bipolar discharge pulses. During the time interval of the two adjacent applied voltage pulses the discharge region is the quasi-neutral plasma region, and meanwhile CF2+ and CF3- are the dominated charged species. Moreover, F and CF3 maintain the relatively stable high densities and uniform axial distributions during the whole period of the applied voltage.
机译：大气压CF4等离子体具有在半导体制造领域的高应用势，因为它可以将CF4等离子体蚀刻的优异能力与易于大气压操作相结合。在这项工作中，流体模型已经进行到由脉冲介电阻挡放电产生的大气压CF4等离子体的数值研究进化特征。计算结果表明，在上升期间平均电子温度显着增加，施加的电压脉冲的下降相，然后迅速降低。放电电流密度具有两个双极短脉冲的波形。电子和CF3 +离子在放电持续时间处形成阴极护套。然而，CF3和F负离子取代电子以在两个双极放电脉冲之间的时间间隔处维持CF4放电等离子体的阴极护套。在两个相邻的施加电压脉冲的时间间隔期间，排出区域是准中性等离子体区域，同时CF2 +和CF3-是主导的带电物质。此外，F和CF3在施加电压的整个周期期间保持相对稳定的高密度和均匀的轴向分布。

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