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首页> 外文期刊>Journal of Materials Engineering and Performance >Structure and Magnetic Properties of Spattered Nd-Fe-B Alloys
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Structure and Magnetic Properties of Spattered Nd-Fe-B Alloys

机译：溅射ND-Fe-B合金的结构和磁性

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摘要

Studies were conducted on the relationship between the composition of Nd-Fe-B alloys, the temperature of the substrate, additional heat treatment and magnetic properties, crystalline phases, and microstructure and texture of films 30 to 300 mum thick produced by ion-plasma sputtering of cast targets. The sputtering rate was maintained at approx 30 mum/h. The axial crystalline texture (001) along the normal to the sputtering plane is formed at a sputtering temperature within the limits ranging from 300 to 450 deg C and higher than 600 deg C. In the intermediate domain of sputtering temperatures, there is a deterioration of the texture (001), or such a change of the indices of the texture when the normal to one of the planes of the zone [010] becomes its axis. Within the framework of the classical theory of crystallization, a model of growth texture formation during the course of sputtering is suggested. The model explains the nonmonotonic change of texture with the change of sputtering temperature. The data obtained about the structure and properties of films have made it possible to optimize the sputtering process with a view to obtaining sputtered magnets with very good permanent magnet properties. Examples of magnetic systems and devices with sputtered magnets are given.
机译：对Nd-Fe-B合金组合物，底物温度，额外的热处理和磁性，结晶相和微观结构以及通过离子等离子体溅射产生的薄膜的微观结构以及薄膜的微观结构以及薄膜的微观结构以及薄膜铸造目标。溅射速率保持在约30毫米/小时。沿着溅射平面的轴向晶体纹理（001）在溅射温度范围内形成溅射温度，在溅射温度的中间结构域中的溅射温度范围为300至450℃并高于600℃。在溅射温度的中间结构域中，存在劣化当区域的平面的正常变为其轴时，纹理（001），或者纹理指数的变化变化。在经典结晶理论的框架内，提出了溅射过程中的生长纹理形成模型。该模型用溅射温度的变化说明了质地的非单调变化。关于薄膜的结构和性质获得的数据使得可以利用具有非常好的永磁特性获得溅射磁体来优化溅射工艺。给出了磁性系统和具有溅射磁体的装置的实例。

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