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首页> 外文期刊>ACS nano >Interfacial Electron Beam Lithography: Chemical Monolayer Nanopatterning via Electron-Beam-Induced Interfacial Solid-Phase Oxidation
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Interfacial Electron Beam Lithography: Chemical Monolayer Nanopatterning via Electron-Beam-Induced Interfacial Solid-Phase Oxidation

机译：界面电子束光刻：通过电子射线诱导的界面固相氧化的化学单层纳米透明剂

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摘要

Chemical nanopatterning-the deliberate nanoscale modification of the chemical nature of a solid surface-is conveniently realized using organic monolayer coatings to impart well-defined chemical functionalities to selected surface regions of the coated solid. Most monolayer patterning methods, however, exploit destructive processes that introduce topographic as well as other undesired structural and chemical transformations along with the desired surface chemical modification. In particular in electron beam lithography (EBL), organic monolayers have been used mainly as ultrathin resists capable of improving the resolution of patterning via local deposition or removal of material. On the basis of the recent discovery of a class of radiation-induced interfacial chemical transformations confined to the contact surface between two solids, we have advanced a direct, nondestructive EBL approach to chemical nanopatterning-interfacial electron beam lithography (IEBL)-demonstrated here by the e-beam-induced local oxidation of the - CH3 surface moieties of a highly ordered self-assembled n-alkylsilane monolayer to-COOH while fully preserving the monolayer structural integrity and molecular organization. In this conceptually different EBL process, the traditional resist is replaced by a thin film coating that acts as a site-activated reagent/catalyst in the chemical modification of the coated surface, here the top surface of the to-be-patterned monolayer. Structural and chemical transformations induced in the thin film coating and the underlying monolayer upon exposure to the electron beam were elucidated using a semiquantitative surface characterization methodology that combines multimode AFM imaging with postpatterning surface chemical modifications and quantitative micro-FTIR measurements. IEBL offers attractive opportunities in chemical nanopatterning, for example, by enabling the application of the advanced EBL technology to the straightforward nanoscale functionalization of the simplest commonly used organosilane monolayers.
机译：化学纳米仪 - 使用有机单层涂层方便地实现了固体表面的化学性质的刻意纳米级改性 - 以掺杂固体的选定表面区域赋予所选择的表面区域，方便地实现了固体表面的化学性质。然而，大多数单层图案化方法利用引入地形的破坏性过程以及其他不期望的结构和化学转化以及所需的表面化学改性。特别是在电子束光刻（EBL）中，有机单层主要用于超薄抗蚀剂，其能够通过局部沉积或去除材料来改善图案化的分辨率。在近期发现一类辐射诱导的界面化学转化局限于两个固体之间的接触表面，我们已经前进的直接，非破坏性EBL方法来实现化学纳米透明仪 - 界面电子束光刻（IEBL） - 这里电子束诱导的局部氧化局部氧化 - CH3表面部分的高度有序的自组装N-烷基硅烷单层致芯片，同时完全保持单层结构完整性和分子组织。在这一概念上不同的EBL方法中，传统的抗蚀剂被薄膜涂层代替，该薄膜涂层用作涂覆表面的化学改性中的位点活化试剂/催化剂，这里是待图案的单层的顶表面。在薄膜涂层和底层单层在暴露于电子束时诱导的结构和化学转化，使用半定位表面表征方法，将多模AFM成像与研磨表面化学修改和定量微FTIR测量结合在一起。 IEBL在化学纳米仪中提供有吸引力的机会，例如，通过使先进的EBL技术应用于最简单的常用的有机硅烷单层的直接纳米级功能化。

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