Thermal and temporal stability of the nitridated Ru/B4C multilayer for high-flux monochromator application

Liu Yang; Huang Qiushi; Qi Runze; Feng Yufei; Zhang Zhong; Yin Guangzhi; Zhang Xingmin; Jiang Hui; Wang Zhanshan

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Thermal and temporal stability of the nitridated Ru/B4C multilayer for high-flux monochromator application

机译：高通量单色仪应用的氮化Ru / B4C多层的热和时间稳定性

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A nitridated R-u/B4C multilayer with period of 3.0 nm and 80 bilayers were fabricated to study thermal and temporal stability. The multilayer was annealed from room temperature to 490 degrees C, and the in situ X-ray measurements showed that the reflectivity remains mostly unchanged up to 300 degrees C. An essential drop of the reflectivity occurred at 490 degrees C with significantly increased interface roughness. Anew layered structure with larger thickness than the original multilayer started to appear at 400 degrees C. The nitridated Ru/B4C multilayer remains intact after two years of storage in air, which demonstrated a very good temporal stability. (C) 2019 Optical Society of America

机译：制造具有3.0nm和80个双层的氮化的R-U / B4C多层，以研究热和时间稳定性。多层从室温退火至490℃，并且原位X射线测量结果表明，反射率仍然长达300℃。反射率的基本下降在490摄氏度下发生，具有显着增加的界面粗糙度。重组厚度大于原始多层的分层结构开始出现在400摄氏度下。在空气中储存两年后，氮化的Ru / B4C多层保持完整，这表明了非常好的时间稳定性。（c）2019年光学学会

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来源
《Applied optics》 |2020年第5期|共6页
作者
Liu Yang; Huang Qiushi; Qi Runze; Feng Yufei; Zhang Zhong; Yin Guangzhi; Zhang Xingmin; Jiang Hui; Wang Zhanshan;
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Tongji Univ Sch Phys Sci &

Engn MOE Inst Precis Opt Engn Key Lab Adv Micro Struct Mat Shanghai 200092 Peoples R China;

Tongji Univ Sch Phys Sci &

Engn MOE Inst Precis Opt Engn Key Lab Adv Micro Struct Mat Shanghai 200092 Peoples R China;

Tongji Univ Sch Phys Sci &

Engn MOE Inst Precis Opt Engn Key Lab Adv Micro Struct Mat Shanghai 200092 Peoples R China;

Tongji Univ Sch Phys Sci &

Engn MOE Inst Precis Opt Engn Key Lab Adv Micro Struct Mat Shanghai 200092 Peoples R China;

Tongji Univ Sch Phys Sci &

Engn MOE Inst Precis Opt Engn Key Lab Adv Micro Struct Mat Shanghai 200092 Peoples R China;

Chinese Acad Sci Shanghai Adv Res Inst Shanghai 201204 Peoples R China;

Chinese Acad Sci Shanghai Adv Res Inst Shanghai 201204 Peoples R China;

Chinese Acad Sci Shanghai Adv Res Inst Shanghai 201204 Peoples R China;

Tongji Univ Sch Phys Sci &

Engn MOE Inst Precis Opt Engn Key Lab Adv Micro Struct Mat Shanghai 200092 Peoples R China;

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Thermal and temporal stability of the nitridated Ru/B4C multilayer for high-flux monochromator application

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