Ultraviolet-transparent low-index layers for antireflective coatings

Schulz Ulrike; Gratzke Nancy; Wolleb Sabrina; Scheinpflug Florian; Rickelt Friedrich; Seifert Tina; Munzert Peter

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Ultraviolet-transparent low-index layers for antireflective coatings

机译：用于抗反射涂层的紫外线透明低折射率层

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Nanostructured low-index layers are useful as the last layers of antireflective (AR) coatings because they can broaden their spectral ranges and improve the performance for oblique light incidence. Structuring of evaporated organic layers by plasma opens a route to produce inorganic interference stacks and low-index layers in the same vacuum process. The organic material uracil has been investigated as a template material for AR nanostructures. An additional plasma-treatment step was added to the manufacturing process, which decreases the organic fraction of the coating substantially. As a result, a better environmental stability and higher transmission in the ultraviolet range was achieved. (C) 2019 Optical Society of America

机译：纳米结构的低折射率层可用作抗反射（AR）涂层的最后一层，因为它们可以拓宽它们的光谱范围，提高倾斜光入射的性能。通过等离子体的蒸发有机层的结构使途径产生在相同的真空过程中产生无机干扰堆叠和低指数层。已经研究了有机材料尿嘧啶作为Ar纳米结构的模板材料。向制造过程中加入另外的等离子体处理步骤，其基本上降低涂层的有机级分。结果，实现了紫外线范围内更好的环境稳定性和更高的传播。（c）2019年光学学会

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来源
《Applied optics》 |2020年第5期|共5页
作者
Schulz Ulrike; Gratzke Nancy; Wolleb Sabrina; Scheinpflug Florian; Rickelt Friedrich; Seifert Tina; Munzert Peter;
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作者单位

Fraunhofer Inst Appl Opt &

Precis Engn A Einstein Str 7 D-07745 Jena Germany;

Fraunhofer Inst Appl Opt &

Precis Engn A Einstein Str 7 D-07745 Jena Germany;

Fraunhofer Inst Appl Opt &

Precis Engn A Einstein Str 7 D-07745 Jena Germany;

Fraunhofer Inst Appl Opt &

Precis Engn A Einstein Str 7 D-07745 Jena Germany;

Fraunhofer Inst Appl Opt &

Precis Engn A Einstein Str 7 D-07745 Jena Germany;

Fraunhofer Inst Appl Opt &

Precis Engn A Einstein Str 7 D-07745 Jena Germany;

Fraunhofer Inst Appl Opt &

Precis Engn A Einstein Str 7 D-07745 Jena Germany;

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Ultraviolet-transparent low-index layers for antireflective coatings

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