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Controlling the duty cycle of holographic crossed gratings by in situ endpoint detection during development

机译:在开发期间,通过原位端点检测控制全息交叉光栅的占空比

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摘要

A method of in situ development endpoint detection is proposed to control the duty cycle of holographic crossed gratings. Based on the observation that after the developer first touches the substrate surface the topography of the crossed grating undergoes an evolution process from a hole array of increasing diameter to a pillar array of decreasing diameter, we set up a development model. In this model, the shapes of both holes and pillars are assumed to have square in-plane cross sections, rotated 45 degrees with respect to the main periodic directions, and straight side walls perpendicular to the grating plane. Thus, the main development process, including the transition from a hole array to a pillar array, can be characterized by a single parameter continuously, and the change of diffraction efficiency during the process can be theoretically calculated. Two different in situ development monitoring conditions were simulated and tested experimentally. Using this method, crossed gratings with various duty cycles were fabricated under different incident and monitoring conditions. (C) 2016 Optical Society of America
机译:提出了一种原位开发端点检测的方法,以控制全息交叉光栅的占空比。基于观察结果:在显影剂首先接触基板表面之后,交叉光栅的形貌从孔阵列的进化过程中的增加直径的柱阵列,我们建立了一种显影模型。在该模型中,假设孔和支柱的形状具有方形面内横截面,相对于主周期方向旋转45度,垂直于光栅平面的直侧壁。因此,主要开发过程包括从孔阵列到柱子阵列的过渡,可以连续地表征单个参数,并且可以理论地计算过程中的衍射效率的变化。通过实验模拟和测试了两种不同的原位开发监测条件。使用该方法,在不同事件和监测条件下制造具有各种占空比的交叉光栅。 (c)2016年美国光学学会

著录项

  • 来源
    《Applied optics》 |2016年第10期|共7页
  • 作者

    Wang Shiwei; Zeng Lijiang;

  • 作者单位

    Tsinghua Univ Dept Precis Instrument State Key Lab Precis Measurement Technol &

    Instru Beijing 100084 Peoples R China;

    Tsinghua Univ Dept Precis Instrument State Key Lab Precis Measurement Technol &

    Instru Beijing 100084 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用;
  • 关键词

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