ZnSe-material phase mask applied to athermalization of infrared imaging systems

Feng Bin; Shi Zelin; Xu Baoshu; Zhang Chengshuo; Zhang Xiaodong

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ZnSe-material phase mask applied to athermalization of infrared imaging systems

机译：应用于红外成像系统的液化材料的ZnSe材料相掩模

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This paper reports a ZnSe-material phase mask that is applied to athermalization of a conventional infrared imaging system. Its principle, design, manufacture, measurement, and performance validation are successively discussed. This paper concludes that a ZnSe-material phase mask has a permissible manufacturing error 2.14 times as large as a Ge-material phase mask. By constructing and solving an optimization problem, the ZnSe-material phase mask is optimally designed. The optimal phase mask is manufactured and measured with a form manufacturing error of 1.370 mu m and a surface roughness value of 9.926 nm. Experiments prove that the wavefront coding athermalized longwave infrared (LWIR) imaging system works well over the temperature range from -40 degrees C to +60 degrees C. (C) 2016 Optical Society of America

机译：本文报道了一种ZnSe材料相位掩模，其应用于传统红外成像系统的热化。其原理，设计，制造，测量和性能验证是连续讨论的。本文得出结论，ZnSe材料相位掩模具有允许的制造误差2.14倍作为GE材料相位掩模。通过构造和解决优化问题，最佳地设计了ZnSe材料相位掩模。用1.370μmm的形式制造误差和9.926nm的表面粗糙度值，制造和测量最佳相掩模。实验证明，波前编码的龙波红外（LWIR）成像系统在-40摄氏度至+60摄氏度的温度范围内运行良好。（c）2016年美国光学学会

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来源
《Applied optics》 |2016年第21期|共6页
作者
Feng Bin; Shi Zelin; Xu Baoshu; Zhang Chengshuo; Zhang Xiaodong;
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作者单位

Xian Technol Univ Sch Optoelect Engn Xian 710032 Peoples R China;

Chinese Acad Sci Shenyang Inst Automat Shenyang 110016 Peoples R China;

Chinese Acad Sci Shenyang Inst Automat Shenyang 110016 Peoples R China;

Chinese Acad Sci Shenyang Inst Automat Shenyang 110016 Peoples R China;

Tianjin Univ Ctr MicroNano Mfg Technol State Key Lab Precis Measuring Technol &

Instrume Tianjin 300072 Peoples R China;

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正文语种 eng
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ZnSe-material phase mask applied to athermalization of infrared imaging systems

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