In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method

Yang Zhiyong; Chen Xiuguo; Jiang Hao; Liu Shiyuan

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In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method

机译：使用主导模式方法的光刻工具的投影镜头在线波前像差调整

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Aberration adjustment is of great importance in the lithographic process of integrated circuit manufacturing due to the pressure variance, lens thermal effects, overlay correction, and 3D mask effects. With the objective of removing the crosstalk effect, as well as reducing computational complexity during in-line application, a dominant mode method is proposed to adjust the aberrations of the projection lens for a lithographic tool. Theoretical definitions and corresponding calculations of dominant modes are proposed to select the compensators of the projection lens and to build the control matrix for compensator settings. The proposed method is successfully applied in a practical aberration adjustment of the projection lens in a lithographic tool, and the results demonstrate its feasibility and performance. (C) 2019 Optical Society of America

机译：由于压力方差，镜头热效应，覆盖校正和3D掩模效果，在集成电路制造的光刻过程中，差距调整非常重要。随着去除串扰效应的目的，以及在线应用期间降低计算复杂性，提出了一种主导模式方法来调节光刻工具的投影透镜的像差。提出了理论定义和相应的主导模式计算以选择投影镜头的补偿器，并为补偿器设置构建控制矩阵。所提出的方法在光刻工具中的投影透镜的实际像差调节中成功应用，结果表明其可行性和性能。（c）2019年光学学会

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来源
《Applied optics》 |2019年第15期|共9页
作者
Yang Zhiyong; Chen Xiuguo; Jiang Hao; Liu Shiyuan;
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作者单位

Huazhong Univ Sci &

Technol State Key Lab Digital Mfg Equipment &

Technol Wuhan 430074 Hubei Peoples R China;

Huazhong Univ Sci &

Technol State Key Lab Digital Mfg Equipment &

Technol Wuhan 430074 Hubei Peoples R China;

Huazhong Univ Sci &

Technol State Key Lab Digital Mfg Equipment &

Technol Wuhan 430074 Hubei Peoples R China;

Huazhong Univ Sci &

Technol State Key Lab Digital Mfg Equipment &

Technol Wuhan 430074 Hubei Peoples R China;

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正文语种 eng
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In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method

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