Single-pulse ablation of multi-depth structures via spatially filtered binary intensity masks

Heath Daniel J.; Grant-Jacob James A.; Eason Robert W.; Mills Ben

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Single-pulse ablation of multi-depth structures via spatially filtered binary intensity masks

机译：通过空间过滤的二元强度掩模的多深度结构的单脉冲消融

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Digital micromirror devices (DMDs) show great promise for use as intensity spatial light modulators. When used in conjunction with pulsed lasers of a timescale below the DMD pixel switching time, DMDs are generally only used as binary intensity masks (i.e., "on" or "off" intensity for each mask pixel). In this work, we show that by exploiting the numerical aperture of an optical system during the design of binary masks, near-continuous intensity control can be accessed, whilst still maintaining high-precision laser-machining resolution. Complex features with ablation depths up to similar to 60 nm, corresponding to grayscale values in bitmap images, are produced in single pulses via ablation with 150 fs laser pulses on nickel substrates, with lateral resolutions of similar to 2.5 mu m.

机译：数字微镜器件（DMDS）显示出用作强度空间光调制器的许多希望。当与DMD像素切换时间低于DMD像素切换时间的时间脉冲的脉冲激光器结合使用时，DMD通常仅用作二进制强度掩模（即，“ON”或“ON”或“OFF”强度为每个掩模像素）。在这项工作中，我们表明，通过在设计二进制掩模期间利用光学系统的数值孔径，可以访问近连续的强度控制，同时仍保持高精度激光加工分辨率。具有与位图图像中的灰度值相似的消融深度至60nm的复杂特征在单个脉冲中通过消融在镍基板上与150 fs激光脉冲产生，横向分辨率类似于2.5μm。

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来源
《Applied optics》 |2018年第8期|共6页
作者
Heath Daniel J.; Grant-Jacob James A.; Eason Robert W.; Mills Ben;
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Univ Southampton Optoelect Res Ctr Southampton SO17 1BJ Hants England;

Univ Southampton Optoelect Res Ctr Southampton SO17 1BJ Hants England;

Univ Southampton Optoelect Res Ctr Southampton SO17 1BJ Hants England;

Univ Southampton Optoelect Res Ctr Southampton SO17 1BJ Hants England;

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Single-pulse ablation of multi-depth structures via spatially filtered binary intensity masks

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