Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing

Liang Shangjuan; Jiao Xiang; Tan Xiaohong; Zhu Jianqiang

摘要

The deployment of polishing slurry is one of the important research topics in the field of chemical-mechanical polishing. It is expected that technological breakthroughs in this process will lead to an improvement of the surface quality of fabricated optical components. In this investigation, we added several types of electrolytes into cerium oxide polishing slurries and evaluated their influence on the material removal rate (MRR) and surface roughness (Sa) during K9 glass polishing. Furthermore, we investigated their influence on the zeta potential, particle size distribution, and suspension stability of the slurries. The results show that the introduction of an electrolyte into the polishing slurry changes not only the zeta potential of the ceria particle surface, but also the type and thickness of the deposited solvent film. The presence of a hydrophilic solvent film results in repulsion between individual particles and between the particles and the glass surface. However, a hydrophobic solvent film enhances the attraction between individual particles and between the particles and the glass surface. Moreover, thicker solvation films correspond to a greater force. This has a great impact on the interfacial interaction between the particles and the glass surface during the polishing process. The presence of the hydrophobic solvent film results in a high MRR, while the hydrophilic solvent film is associated with low Sa. In this paper, the interaction mechanisms of the abrasive particles and the glass interface during the polishing process are elucidated by considering the zeta potential and the solvent film type. In addition, a method for reducing the resulting Sa after glass polishing is proposed. (C) 2018 Optical Society of America

机译：抛光浆料的部署是化学机械抛光领域的重要研究主题之一。预计该过程中的技术突破将导致制造光学部件的表面质量的提高。在该研究中，我们将几种类型的电解质添加到氧化铈抛光浆料中，并在K9玻璃抛光期间评价它们对材料去除率（MRR）和表面粗糙度（SA）的影响。此外，我们研究了对浆料的Zeta电位，粒度分布和悬浮稳定性的影响。结果表明，将电解质引入抛光浆料中不仅改变了沉积的溶剂膜的Zeta电位，还改变了沉积的溶剂膜的类型和厚度。亲水性溶剂膜的存在导致各个颗粒和颗粒和玻璃表面之间的排斥。然而，疏水性溶剂膜增强了各个颗粒和颗粒和玻璃表面之间的吸引力。此外，较厚的溶剂化膜对应于更大的力。这对抛光过程中颗粒和玻璃表面之间的界面相互作用产生了很大的影响。疏水性溶剂膜的存在导致高MRR，而亲水性溶剂膜与低SA相关。本文通过考虑ζ电位和溶剂膜类型，阐明了磨料颗粒和玻璃界面的相互作用机理。另外，提出了一种用于在玻璃抛光之后减少所得SA的方法。（c）2018年光学学会

Effect of solvent film and zeta potential on interfacial interactions during optical glass polishing

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